Magnetron sputter deposition as visualized by Monte Carlo modeling

Thin Solid Films

Volumn 520, Issue 20, 2012, Pages 6337-6354

  Depla, D ^a   Leroy, W P ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Deposition profile; LIF; Magnetron sputtering; Monte Carlo; Simulation; Thermalization; Transport

Indexed keywords

DEPOSITION PROFILES; LIF; MONTE CARLO; SIMULATION; THERMALIZATION; TRANSPORT;

ATOMS; DENSITY OF GASES; ENERGY DISSIPATION; FILM GROWTH; MAGNETRON SPUTTERING; THIN FILMS; VAPOR DEPOSITION;

MONTE CARLO METHODS;

EID: 84863990622     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.06.032     Document Type: Review

References (91)

1. H.K. Pulker Coatings on Glass 1999 Elsevier Science B.V
2. J.J. Hanak, R.K. Wehner, and H.W. Lehmann J. Appl. Phys. 43 4 1972 1666-&
3. V. Pereira, R. Silva, and J.R. Nicholls Aerosp. Sci. Technol. 10 5 2006 442
4. K.S. Fancey Surf. Coat. Technol. 71 1 1995 16
5. S. Hong, E. Kim, B.S. Bae, K. No, S.C. Lim, S.G. Woo, and Y.B. Koh J. Vac. Sci. Technol. A 14 5 1996 2721
6. S. Baek, and V. Prabhu Mater. Manuf. Process. 24 12 2009 1331
7. B.W. Tao, X.W. Deng, Y. Zhang, and Y.R. Li J. Vac. Sci. Technol., A 22 4 2004 1134
8. S. Swann, S.A. Collett, and I.R. Scarlett J. Vac. Sci. Technol. A 8 3 1990 1299
9. R.S. Upadhye, and E.J. Hsieh J. Vac. Sci. Technol. A 8 3 1990 1348
10. S. Bosch J. Vac. Sci. Technol. A 10 1 1992 98
11. L. Holland Vacuum Deposition of Thin Films 1966 Chapman and Hall Ltd. London
12. T. Motohiro J. Vac. Sci. Technol. A 4 2 1986 189
13. A. Settaouti, and L. Settaouti Appl. Surf. Sci. 254 18 2008 5750
14. G.M. Turner, I.S. Falconer, B.W. James, and D.R. McKenzie J. Appl. Phys. 65 9 1989 3671
15. S. Khorram, S. Sobhanian, and H. Naghshara J. Appl. Phys. 109 7 2011 073305
16. P.K. Petrov, V.A. Volpyas, and R.A. Chakalov Vacuum 52 4 1999 427
17. O. Yamazaki, K. Iyanagi, S. Takagi, and K. Nanbu Jpn. J. Appl. Phys., Part 1 41 3A 2002 1230
18. K. Macak, P. Macak, and U. Helmersson Comput. Phys. Commun. 120 2-3 1999 238
19. A.M. Myers, J.R. Doyle, J.R. Abelson, and D.N. Ruzic J. Vac. Sci. Technol. A 9 3 1991 614
20. A. Caillard, C. Charles, R.W. Boswell, and P. Brault IEEE Trans. Plasma Sci. 36 4 2008 884
21. R. Sobbia, P.K. Browning, and J.W. Bradley J. Vac. Sci. Technol., A 26 1 2008 103
22. A. Caillard, C. Charles, R. Boswell, A. Meige, and P. Brault Plasma Sources Sci. Technol. 17 3 2008 035028
23. U.H. Kwon, and W.J. Lee Jpn. J. Appl. Phys., Part 1 45 11 2006 8629
24. T. Kobayashi Appl. Surf. Sci. 169 2001 405
25. A. Malaurie, and A. Bessaudou Thin Solid Films 286 1-2 1996 305
26. T. Heberlein, G. Krautheim, and W. Wuttke Vacuum 42 1-2 1991 47
27. K. Van Aeken, S. Mahieu, and D. Depla J. Phys. D: Appl. Phys. 41 20 2008 205307
28. A. Fillon, G. Abadias, A. Michel, and C. Jaouen Thin Solid Films 519 5 2010 1655
29. M. Horkel, K. Van Aeken, C. Eisenmenger-Sittner, D. Depla, S. Mahieu, and W.P. Leroy J. Phys. D: Appl. Phys. 43 7 2010 075302
30. H. Hidalgo, E. Reguzina, E. Millon, A. Thomann, J. Mathias Boulmer-Leborgne, T. Sauvage, and P. Brault Surf. Coat. Technol. 205 19 2011 4495
31. J.M. Garcia-Martin, R. Alvarez, P. Romero-Gomez, A. Cebollada, and A. Palmero Appl. Phys. Lett. 97 17 2010 173103
32. L. Dreesen, J.F. Colomer, H. Limage, A. Giguere, and S. Lucas Thin Solid Films 518 1 2009 112
33. D. Depla, J. Haemers, G. Buyle, and R. De Gryse J. Vac. Sci. Technol., A 24 4 2006 934
34. SRIM Stopping and range of ions in materials can be downloaded from www.srim.org
35. M.W. Thompson Vacuum 66 2 2002 99
36. C. Eisenmengersittner, R. Beyerknecht, A. Bergauer, W. Bauer, and G. Betz J. Vac. Sci. Technol. A 13 5 1995 2435
37. Z.L. Zhang, and L. Zhang Radiat. Eff. Defects Solids 159 5 2004 301
38. S.O. Klemm, A.G. Martin, J. Lengsfeld, J.C. Schauer, B. Schuhmacher, and A.W. Hassel Phys. Status Solidi A 207 4 2010 801
39. J.F. Groves, G. Mattausch, H. Morgner, D.D. Hass, and H.N.G. Wadley R. Bakish, Proceedings of the Conference on Electron Beam Melting and Refining - State of the Art 2000 Millennium Conference 2000 Bakish Materials Corp. Englewood 236
40. L. H., and S. W. Vacuum 11 4 1952 346
41. S. Swann Vacuum 38 8-10 1988 791
42. C. Liu, R. Conley, L. Assoufid, A.T. Macrander, G.E. Ice, J.Z. Tischler, and K. Zhang J. Vac. Sci. Technol., A 21 4 2003 1579
43. J.A. Thornton J. Vac. Sci. Technol. A 4 6 1986 3059
44. S. Mahieu, and D. Depla J. Phys. D Appl. Phys. 42 5 2009 053002
45. K. Meyer, I.K. Schuller, and C.M. Falco J. Appl. Phys. 52 9 1981 5803
46. J.H. Keller, and R.G. Simmons IBM J. Res. Dev. 23 1 1979 24
47. S.D. Ekpe, L.W. Bezuidenhout, and S.K. Dew Thin Solid Films 474 1-2 2005 330
48. W.D. Westwood J. Vac. Sci. Technol. 15 1 1978 1
49. A. Grasmarti, and J.A. Vallesabarca J. Appl. Phys. 54 2 1983 1071
50. N. Matsunami, Y. Yamamura, Y. Itikawa, N. Itoh, Y. Kazumata, S. Miyagawa, K. Morita, R. Shimizu, and H. Tawara At. Data Nucl. Data Tables 31 1 1984 1
51. J.H. Jeans The Dynamical Theory of Gases 2th ed 1916 University Press of Cambridge
52. T.E. Drusedau Surf. Coat. Technol. 174 2003 470
53. Y. Yamamura, T. Takiguchi, and M. Ishida Radiat. Eff. Defects Solids 118 3 1991 237
54. J.C. Helmer, and C.E. Wickersham J. Vac. Sci. Technol., A 4 3 1986 408
55. T. Nakano, and S. Baba Vacuum 80 7 2006 647
56. B. Straumal, N. Vershinin, K. Filonov, R. Dimitriou, and W. Gust Thin Solid Films 351 1-2 1999 204
57. B.L. Sopori, and W.S.C. Chang J. Vac. Sci. Technol. 14 3 1977 782
58. T. Yamazaki, Y. Yoshino, T. Yoshizawa, T. Yamabuchi, K. Terayama, T. Shimazaki, and T. Mizuguchi Jpn. J. Appl. Phys., Part 1 35 9A 1996 4755
59. S. Swann J. Vac. Sci. Technol. A 5 4 1987 1750
60. I.A. Blech, and H.A. Vanderplas J. Appl. Phys. 54 6 1983 3489
61. B. Feddes, J.G.C. Wolke, J.A. Jansen, and A.M. Vredenberg J. Appl. Phys. 93 1 2003 662
62. G. Vago, L. Backhausz, and A.R. Herman Vacuum 40 1-2 1990 23
63. C. Eisenmengersittner, A. Bergauer, H. Bangert, and W. Bauer J. Vac. Sci. Technol. A 12 2 1994 536
64. M. Panjan, R. Cremer, H.G. Fuss, P. Panjan, and M. Cekada Vacuum 84 1 2009 45
65. X.Y. Li, D. Depla, W.P. Leroy, J. Haemers, and R. De Gryse J. Phys. D Appl. Phys. 41 3 2008 035203
66. D. Depla, X.Y. Li, S. Mahieu, K. Van Aeken, W.P. Leroy, J. Haemers, R. De Gryse, and A. Bogaerts J. Appl. Phys. 107 11 2010 113307
67. R.J. Hill, and S.J. Nadel Coated Glass Applications and Markets 1999 BOC Coating Technology Group, Inc. Fairfield
68. H.A. McGee Molecular Engineering 1991 McGraw-Hill New York
69. S. Erkoc D. Stauffer, Annual Reviews of Computational Physics IX 2001 World Scientific Publishing Co. Singapore
70. P.R. Willmott Prog. Surf. Sci. 76 6-8 2004 163
71. M. Saraiva, V. Georgieva, S. Mahieu, K. Van Aeken, A. Bogaerts, and D. Depla J. Appl. Phys. 107 3 2010 034902
72. J.C. Zhao Prog. Mater. Sci. 51 5 2006 557
73. V. Chevrier, and J.R. Dahn Meas. Sci. Technol. 17 6 2006 1399
74. J.R. Dahn, S. Trussler, T.D. Hatchard, A. Bonakdarpour, J.R. Mueller-Neuhaus, K.C. Hewitt, and M. Fleischauer Chem. Mater. 14 8 2002 3519
75. V. Abhilash, M.A. Sumesh, and S. Mohan Smart Mater. Struct. 14 5 2005 S323
76. V. Dolique, A.L. Thomann, P. Brault, Y. Tessier, and P. Gillon Mater. Chem. Phys. 117 1 2009 142
77. A. Goehlich Appl. Phys. A: Mater. Sci. Process. 72 5 2001 523
78. N.J. Kang, S.G. Oh, F. Gaboriau, and A. Ricard Rev. Sci. Instrum. 81 1 2010 013102
79. R.V. Stuart, K. Brower, and W. Mayer Rev. Sci. Instrum. 34 4 1963 425-&
80. N. Britun, J.G. Han, and S.G. Oh Plasma Sources Sci. Technol. 17 4 2008 045013
81. C. Vitelaru, L. de Poucques, T.M. Minea, and G. Popa Plasma Sources Sci. Technol. 20 4 2011 045020
82. C. Vitelaru, L. de Poucques, T. Hytkova, T.M. Minea, C. Boisse-Laporte, J. Bretagne, and G. Popa Plasma Process. Polym. 6 2009 S326
83. Vitelaru, C., Caractérisation du procédé plasma de pulverisation cathodique magnétron à ionisation additionnnelle pour la synthèse de couches minces2011, Orsay, France: PhD Thesis Université Paris Sud-XI Laboratoire de Physique des Gaz et des Plasmas.
84. L. de Poucques, C. Vitelaru, T.M. Minea, J. Bretagne, and G. Popa Epl 82 1 2008 15002
85. M. Wolter, H.T. Do, H. Steffen, and R. Hippler J. Phys. D: Appl. Phys. 38 14 2005 2390
86. J. Olejnicek, H.T. Do, Z. Hubicka, R. Hippler, and L. Jastrabik Jpn. J. Appl. Phys., Part 1 45 10B 2006 8090
87. S. Mahieu, P. Ghekiere, D. Depla, and R. De Gryse Thin Solid Films 515 4 2006 1229
88. Ghekiere, P., Structure evolution of biaxially aligned thin films deposited by sputtering 2007, Gent, Belgium: PhD thesis, Ghent University.
89. X.W. Zhou, and H.N.G. Wadley Surf. Sci. 431 1-3 1999 42
90. J.C.S. Kools J. Vac. Sci. Technol., A 23 1 2005 85
91. S.M. Rossnagel, D. Mikalsen, H. Kinoshita, and J.J. Cuomo J. Vac. Sci. Technol., A 9 2 1991 261