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Volumn 36, Issue 4 PART 1, 2008, Pages 884-885
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Transport and deposition of plasma-sputtered platinum atoms: Comparison between experiments and simulation
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Author keywords
Argon; Atomic layer deposition; Deposition; Monte Carlo; Plasma sputtering; Plasmas; Platinum; Silicon; Sputtering; Substrates
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Indexed keywords
ARGON;
ATOMIC PHYSICS;
DEPOSITION RATES;
ELECTRIC POWER DISTRIBUTION;
INERT GASES;
MONTE CARLO METHODS;
PLASMA DEPOSITION;
PLASMAS;
PLATINUM;
SPUTTER DEPOSITION;
SPUTTERING;
THREE DIMENSIONAL;
WALLS (STRUCTURAL PARTITIONS);
ARGON IONS;
ARGON PLASMAS;
ATOMIC LAYER DEPOSITION;
CHAMBER WALLS;
DEPOSITION;
ENERGY DISTRIBUTIONS;
EXPERIMENTAL DEPOSITION;
INITIAL ENERGY;
MONTE CARLO;
MONTE CARLO SIMULATION;
PLASMA SCIENCE;
PLASMA SPUTTERING;
PLATINUM ATOMS;
PT ATOMS;
PT SPUTTERING;
SILICON;
SPUTTERED ATOMS;
SPUTTERED PARTICLES;
SUBSTRATES;
THOMPSON;
ATOMS;
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EID: 50249160171
PISSN: 00933813
EISSN: None
Source Type: Journal
DOI: 10.1109/TPS.2008.924421 Document Type: Article |
Times cited : (2)
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References (6)
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