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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 11, 2006, Pages 8629-8638

Multiscale Monte Carlo simulation of circular DC magnetron sputtering: Influence of magnetron design on target erosion and film deposition

(2) Kwon, Ui Hui a Lee, Won Jong b

a SAMSUNG Electronics (South Korea)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

Deposition; Erosion; Magnetron sputtering; Monte Carlo simulation; Topography

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; MAGNETRON SPUTTERING; MONTE CARLO METHODS; SPUTTER DEPOSITION;

FILM DEPOSITION; TARGET EROSION; WAFERLEVEL DEPOSITION UNIFORMITY;

THIN FILMS;

EID: 34547868542 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.8629 Document Type: Article

Times cited : (16)

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