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Volumn 519, Issue 5, 2010, Pages 1655-1661

Stress and microstructure evolution during growth of magnetron-sputtered low-mobility metal films: Influence of the nucleation conditions

Author keywords

Coherence stress; Crystallization; In situ wafer curvature; Interfaces

Indexed keywords

ALLOY FILM; AMORPHOUS LAYER; AMORPHOUS SI; COHERENCE STRESS; CRITICAL FILM THICKNESS; CRYSTALLINE TRANSITION; DENSIFICATION STRAIN; FILM MICROSTRUCTURES; GRAIN SIZE; IN-PLANE GRAIN SIZE; IN-SITU; INTERFACES; LOW-MOBILITY; METAL FILM; MICROSTRUCTURE EVOLUTIONS; STEADY STATE STRESS; STRESS BEHAVIOUR; STRESS EVOLUTION; UNDERLAYERS; WAFER CURVATURE TECHNIQUE; WORKING PRESSURES;

EID: 78649754144     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.091     Document Type: Conference Paper
Times cited : (52)

References (40)
  • 35
    • 78649731929 scopus 로고
    • L.A. Davis Metallic Glasses, 1978 American Society of Metals Metals Park, Ohio 70
    • (1978) , pp. 70
    • Davis, L.A.1
  • 37
    • 78649743167 scopus 로고    scopus 로고
    • 2Ψ method, unpublished results
    • 2Ψ method, unpublished results.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.