Numerical simulation of the characteristics of the different metallic species falling on the growing film in d.c. Magnetron sputtering

Thin Solid Films

Volumn 286, Issue 1-2, 1996, Pages 305-316

  Malaurie, A ^a   Bessaudou, A ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Computer simulation; Metals; Physical vapour deposition; Sputtering

Indexed keywords

ALUMINUM ALLOYS; COMPUTER SIMULATION; FILM GROWTH; MONTE CARLO METHODS; TITANIUM ALLOYS; TRANSPORT PROPERTIES;

ALLOYED COATING; BACKGROUND GAS; BINARY ALLOYED TARGET; GROWING FILM; SPUTTERED METALS;

MAGNETRON SPUTTERING;

EID: 0030235107     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(95)08523-8     Document Type: Article

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