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Journal of Physics D: Applied Physics
Volumn 41, Issue 3, 2008, Pages
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
Author keywords

[No Author keywords available]
Indexed keywords

ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; REACTIVE SPUTTERING; ROTATION;
EID: 43049117190     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/3/035203     Document Type: Article
Times cited : (23)
References (10)
  • 2
    • 0033703601 scopus 로고    scopus 로고
    • Recent aspects concerning DC reactive magnetron sputtering of thin films: A review
    • Safi I 2000 Recent aspects concerning DC reactive magnetron sputtering of thin films: a review Surf. Coat. Technol. 127 203-18
    • (2000) Surf. Coat. Technol. , vol.127 , Issue.2-3 , pp. 203-218
    • Safi, I.1
  • 3
    • 0008234884 scopus 로고
    • An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O/Ar ratio, in Ti-O reactive sputtering processes
    • Kusano E 1991 An investigation of hysteresis effects as a function of pumping speed, sputtering current, and O/Ar ratio, in Ti-O reactive sputtering processes J. Appl. Phys. 70 7089-96
    • (1991) J. Appl. Phys. , vol.70 , Issue.11 , pp. 7089-7096
    • Kusano, E.1
  • 4
    • 13844309319 scopus 로고    scopus 로고
    • Fundamental understanding and modeling of reactive sputtering process
    • Berg S and Nyberg T 2005 Fundamental understanding and modeling of reactive sputtering process Thin Solid Films 476 215-30
    • (2005) Thin Solid Films , vol.476 , Issue.2 , pp. 215-230
    • Berg, S.1    Nyberg, T.2
  • 6
    • 0017945583 scopus 로고
    • Magnetron sputtering: Basic physics and application to cylindrical magnetrons
    • Thornton J A 1978 Magnetron sputtering: basic physics and application to cylindrical magnetrons J. Vac. Sci. Technol. 15 171-7
    • (1978) J. Vac. Sci. Technol. , vol.15 , Issue.2 , pp. 171-177
    • Thornton, J.A.1
  • 8
    • 33748791449 scopus 로고    scopus 로고
    • Discharge voltage measurements during reactive sputtering of oxides
    • Depla D, Haemers J and De Gryse R 2006 Discharge voltage measurements during reactive sputtering of oxides Thin Solid Films 515 468-71
    • (2006) Thin Solid Films , vol.515 , Issue.2 , pp. 468-471
    • Depla, D.1    Haemers, J.2    De Gryse, R.3
  • 9
    • 33748350922 scopus 로고    scopus 로고
    • Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: A Monte Carlo simulation
    • Musschoot J, Depla D, Buyle G, Haemers J and De Gryse R 2006 Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation J. Phys. D: Appl. Phys. 39 3989-93
    • (2006) J. Phys. D: Appl. Phys. , vol.39 , Issue.18 , pp. 3989-3993
    • Musschoot, J.1    Depla, D.2    Buyle, G.3    Haemers, J.4    De Gryse, R.5
  • 10
    • 33846279408 scopus 로고    scopus 로고
    • Understanding the discharge voltage behaviour during reactive magnetron sputtering of oxides
    • Depla D, Heirwegh S, Mahieu S, Haemers J and De Gryse R 2007 Understanding the discharge voltage behaviour during reactive magnetron sputtering of oxides J. Appl. Phys. 101 013301-9
    • (2007) J. Appl. Phys. , vol.101 , pp. 013301-013309
    • Depla, D.1    Heirwegh, S.2    Mahieu, S.3    Haemers, J.4    De Gryse, R.5

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.