|
Volumn 174-175, Issue , 2003, Pages 470-474
|
Investigation of the throw distance of sputtered atoms under consideration of gas rarefaction
|
Author keywords
Argon; Direct current; Growth models; Sputtering; Tantalum; Throw distance
|
Indexed keywords
ARGON;
BINDING ENERGY;
CHROMIUM;
INTERFACIAL ENERGY;
SPUTTERED ATOMS;
SPUTTER DEPOSITION;
COATING;
INDUSTRIAL APPLICATION;
PLASMA;
SURFACE PROPERTY;
|
EID: 18244429782
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00325-6 Document Type: Article |
Times cited : (10)
|
References (12)
|