Complex structure/composition relationship in thin films of AlCoCrCuFeNi high entropy alloy

Materials Chemistry and Physics

Volumn 117, Issue 1, 2009, Pages 142-147

  Dolique, V ^a   Thomann, A L ^a   Brault, P ^a   Tessier, Y ^a   Gillon, P ^b  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b CNRS   (France)

Author keywords

Alloys; Anti adhesive properties; Plasma sputtering deposition; Thin films

Indexed keywords

ANTI-ADHESIVE PROPERTIES; CHEMICAL COMPOSITIONS; CRYSTALLINE PHASIS; CRYSTALLINE STRUCTURE; DC MAGNETRON SPUTTERING; ENERGY DISPERSIVE X-RAY SPECTROMETRY; FILM COMPOSITION; HIGH ENTROPY ALLOYS; HYDROPHOBIC PROPERTIES; MOSAIC TARGET; PLASMA SPUTTERING DEPOSITION; POWER SUM; SI(1 0 0); WATER DROPLETS; WETTING CONTACT ANGLES;

ALLOYS; CERIUM ALLOYS; CONTACT ANGLE; CRYSTALLINE MATERIALS; MAGNETRONS; MORPHOLOGY; PLASMA DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; WETTING;

DEPOSITION;

EID: 67650260359     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.05.025     Document Type: Article

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