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Volumn 254, Issue 18, 2008, Pages 5750-5756

Simulation of the transport of sputtered atoms and effects of processing conditions

Author keywords

Monte Carlo simulations; Sputtered particle transport; Sputtering

Indexed keywords

COLLISION AVOIDANCE; COMPUTER SIMULATION; DEPOSITION RATES; MATHEMATICAL MODELS; MONTE CARLO METHODS; SPUTTER DEPOSITION; SUBSTRATES;

EID: 44349131461     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.042     Document Type: Article
Times cited : (19)

References (26)
  • 19
    • 8744301960 scopus 로고    scopus 로고
    • Multiscale modeling and control of RF diode sputter deposition for GMR thin films
    • Boston, Massachusetts June 30-July 2
    • Ghosal S., Kosut R.L., Ebert J.L., and Porter II L.L. Multiscale modeling and control of RF diode sputter deposition for GMR thin films. Proceedings of the 2004 American Control Conference. Boston, Massachusetts June 30-July 2 (2004) 3930-3941
    • (2004) Proceedings of the 2004 American Control Conference , pp. 3930-3941
    • Ghosal, S.1    Kosut, R.L.2    Ebert, J.L.3    Porter II, L.L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.