Suppression of nanoscopic shadowing during physical vapor deposition by biased diffusion

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 85-89

  Kools, J C S ^a,b  

^a VEECO INSTRUMENTS INC   (United States)

^b In Silicio SAS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR DYNAMICS SIMULATIONS; NANOSCOPIC GROWTH; SHADOWING EFFECTS;

DEFECTS; DIFFUSION; EPITAXIAL GROWTH; MOLECULAR DYNAMICS; POTENTIAL ENERGY;

PHYSICAL VAPOR DEPOSITION;

EID: 29244463824     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1827627     Document Type: Article

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