Ab initio study of oxygen interstitial diffusion near Si:Hf O2 interfaces

Physical Review B - Condensed Matter and Materials Physics

Volumn 75, Issue 24, 2007, Pages

  Tang, Chunguang ^a   Ramprasad, Ramamurthy ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34347385632     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.75.241302     Document Type: Article

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