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Volumn 20, Issue 41, 2010, Pages 8987-8993

Input of atomic layer deposition for solid oxide fuel cell applications

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; HIGH QUALITY; HIGH-TEMPERATURE ANNEALING; HIGH-TEMPERATURE DEVICES; HIGH-TEMPERATURE WATER; MONOATOMIC LAYER; PROTECTIVE LAYERS; PROTON-ELECTROLYTE FUEL CELLS; SOLID OXIDE; THIN LAYERS; TYPE SYSTEMS;

EID: 77957918632     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/c0jm00590h     Document Type: Article
Times cited : (74)

References (71)
  • 8
  • 46
    • 77957914525 scopus 로고    scopus 로고
    • Ph.D. Thesis, ENSCP, University of Paris 6, France
    • C. Brahim, Ph.D. Thesis, ENSCP, University of Paris 6, France, 2006
    • (2006)
    • Brahim, C.1
  • 53
    • 77957915433 scopus 로고    scopus 로고
    • Ph.D.; Thesis University of Paris 6, France
    • E. Gourba Ph.D.; Thesis, ENSCP, University of Paris 6, France, 2004
    • (2004)
    • Gourba, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.