Recent progress in source development for extreme UV lithography

Journal of Modern Optics

Volumn 59, Issue 10, 2012, Pages 855-872

  O'Sullivan, Gerry ^a   Kilbane, Deirdre ^a   Darcy, Rebekah ^a  

^a UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

conversion efficiency; EUV lithography; laser produced plasma; tin emission

Indexed keywords

EXPOSURE TOOL; EXTREME ULTRAVIOLET; EXTREME UV LITHOGRAPHIES; HIGH-VOLUME MANUFACTURING; IN-BAND; LASER DESIGNS; MANUFACTURING TOOLS; MOORE'S LAW; OPTICAL POWER; PLASMA PROCESS; POWER OUT PUT; RECENT PROGRESS; SEMI-CONDUCTOR FABRICATION; TIN DROPLETS; TIN PLASMA;

CARBON DIOXIDE; CONVERSION EFFICIENCY; ELECTRON TEMPERATURE; EXTREME ULTRAVIOLET LITHOGRAPHY; GADOLINIUM; MANUFACTURE; TIN;

LASER PRODUCED PLASMAS;

EID: 84861051643     PISSN: 09500340     EISSN: 13623044     Source Type: Journal    
DOI: 10.1080/09500340.2012.678399     Document Type: Review

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