-
1
-
-
24144498792
-
Extreme ultraviolet lithography: Overview and development status
-
DOI 10.1117/1.1862647, 011006, Reportnr NGL-03
-
P. J. Silverman, J. Microlighogr., Microfabr., Microsyt. 4, 011006 (2005). 10.1117/1.1862647 (Pubitemid 41238150)
-
(2005)
Journal of Microlithography, Microfabrication and Microsystems
, vol.4
, Issue.1
, pp. 1-5
-
-
Silverman, P.J.1
-
2
-
-
0036671788
-
Improved reflectance and stability of Mo-Si multilayers
-
DOI 10.1117/1.1489426
-
S. Bajt, J. Alameda, T. Barbee, Jr., W. Clift, J. Folta, B. Kaufmann, and E. Spiller, Opt. Eng. 41, 1797 (2002). 10.1117/1.1489426 (Pubitemid 35019741)
-
(2002)
Optical Engineering
, vol.41
, Issue.8
, pp. 1797-1804
-
-
Bajt, S.1
Alameda, J.B.2
Barbee Jr., T.W.3
Cliff, W.M.4
Folta, J.A.5
Kaufmann, B.6
Spiller, E.A.7
-
4
-
-
30344476130
-
Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas
-
DOI 10.1063/1.2139990, 241502
-
Y. Tao, H. Nishimura, T. Okuno, S. Fujioka, N. Ueda, M. Nakai, K. Nagai, T. Norimatsu, N. Miyanaga, and K. Nishihara, Appl. Phys. Lett. 87, 241502 (2005). 10.1063/1.2139990 (Pubitemid 43054855)
-
(2005)
Applied Physics Letters
, vol.87
, Issue.24
, pp. 1-3
-
-
Tao, Y.1
Nishimura, H.2
Okuno, T.3
Fujioka, S.4
Ueda, N.5
Nakai, M.6
Nagai, K.7
Norimatsu, T.8
Miyanaga, N.9
Nishihara, K.10
Izawa, Y.11
-
5
-
-
2342535109
-
-
10.1116/1.1667511
-
M. Richardson, C. Koay, K. Takenoshita, C. Keyser, and M. Al-Rabban, J. Vac. Sci. Technol., B 22, 785 (2004). 10.1116/1.1667511
-
(2004)
J. Vac. Sci. Technol., B
, vol.22
, pp. 785
-
-
Richardson, M.1
Koay, C.2
Takenoshita, K.3
Keyser, C.4
Al-Rabban, M.5
-
6
-
-
57349092465
-
-
10.1063/1.3036956
-
S. Yuspeh, K. L. Sequoia, Y. Tao, M. S. Tillack, R. Burdt, and F. Najmabadi, Appl. Phys. Lett. 93, 221503 (2008). 10.1063/1.3036956
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 221503
-
-
Yuspeh, S.1
Sequoia, K.L.2
Tao, Y.3
Tillack, M.S.4
Burdt, R.5
Najmabadi, F.6
-
8
-
-
65649121950
-
-
10.1117/12.807525
-
K. Okazaki, D. Nakamura, T. Akiyama, K. Toya, A. Takahashi, and T. Okada, Proc. SPIE 7201, 72010T (2009). 10.1117/12.807525
-
(2009)
Proc. SPIE
, vol.7201
-
-
Okazaki, K.1
Nakamura, D.2
Akiyama, T.3
Toya, K.4
Takahashi, A.5
Okada, T.6
-
9
-
-
33847730710
-
Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source
-
DOI 10.1063/1.2426883
-
Y. Tao, M. S. Tillack, S. S. Harilal, K. L. Sequoia, and F. Najmabadi, J. Appl. Phys. 101, 023305 (2007). 10.1063/1.2426883 (Pubitemid 46372758)
-
(2007)
Journal of Applied Physics
, vol.101
, Issue.2
, pp. 023305
-
-
Tao, Y.1
Tillack, M.S.2
Harilal, S.S.3
Sequoia, K.L.4
Najmabadi, F.5
-
10
-
-
36849083445
-
2 laser-produced Sn plasma using a cavity target
-
DOI 10.1063/1.2820451
-
Y. Ueno, G. Soumagne, A. Sumitani, A. Endo, and T. Higashiguchi, Appl. Phys. Lett. 91, 231501 (2007). 10.1063/1.2820451 (Pubitemid 350234421)
-
(2007)
Applied Physics Letters
, vol.91
, Issue.23
, pp. 231501
-
-
Ueno, Y.1
Soumagne, G.2
Sumitani, A.3
Endo, A.4
Higashiguchi, T.5
-
11
-
-
77949702791
-
-
10.1063/1.3364141
-
S. Harilal, T. Sizyuk, V. Sizyuk, and A. Hassanein, Appl. Phys. Lett. 96, 111503 (2010). 10.1063/1.3364141
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 111503
-
-
Harilal, S.1
Sizyuk, T.2
Sizyuk, V.3
Hassanein, A.4
-
12
-
-
67149139972
-
-
10.1117/12.814228
-
D. Brandt, I. Fomenkov, A. Ershov, W. Partlo, D. Myers, N. Bwering, N. Farrar, G. Vaschenko, O. Khodykin, and A. Bykanov, Proc. SPIE 7271, 727103 (2009). 10.1117/12.814228
-
(2009)
Proc. SPIE
, vol.7271
, pp. 727103
-
-
Brandt, D.1
Fomenkov, I.2
Ershov, A.3
Partlo, W.4
Myers, D.5
Bwering, N.6
Farrar, N.7
Vaschenko, G.8
Khodykin, O.9
Bykanov, A.10
-
13
-
-
69949138080
-
-
10.1117/12.820966
-
Y. Ueno, T. Yanagida, T. Suganuma, H. Komori, A. Sumitani, and A. Endo, Proc. SPIE 7361, 73610X (2009). 10.1117/12.820966
-
(2009)
Proc. SPIE
, vol.7361
-
-
Ueno, Y.1
Yanagida, T.2
Suganuma, T.3
Komori, H.4
Sumitani, A.5
Endo, A.6
-
17
-
-
36549096772
-
-
10.1063/1.95057
-
A. Ng, D. Pasini, P. Celliers, D. Parfeniuk, L. Da Silva, and J. Kwan, Appl. Phys. Lett. 45, 1046 (1984). 10.1063/1.95057
-
(1984)
Appl. Phys. Lett.
, vol.45
, pp. 1046
-
-
Ng, A.1
Pasini, D.2
Celliers, P.3
Parfeniuk, D.4
Da Silva, L.5
Kwan, J.6
-
18
-
-
69149085169
-
-
10.1063/1.3190537
-
R. Burdt, S. Yuspeh, K. Sequoia, Y. Tao, M. Tillack, and F. Najmabadi, J. Appl. Phys. 106, 033310 (2009). 10.1063/1.3190537
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 033310
-
-
Burdt, R.1
Yuspeh, S.2
Sequoia, K.3
Tao, Y.4
Tillack, M.5
Najmabadi, F.6
-
19
-
-
77954343426
-
-
10.1063/1.3458696
-
S. Yuspeh, K. L. Sequoia, Y. Tao, M. S. Tillack, R. A. Burdt, and F. Najmabadi, Appl. Phys. Lett. 96, 261501 (2010). 10.1063/1.3458696
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 261501
-
-
Yuspeh, S.1
Sequoia, K.L.2
Tao, Y.3
Tillack, M.S.4
Burdt, R.A.5
Najmabadi, F.6
-
20
-
-
67149139972
-
-
10.1117/12.814272
-
I. Fomenkov, D. Brandt, A. Bykanov, A. Ershov, W. Partlo, D. Myers, N. Bwering, N. Farrar, G. Vaschenko, and O. Khodykin, Proc. SPIE 7271, 727138 (2009). 10.1117/12.814272
-
(2009)
Proc. SPIE
, vol.7271
, pp. 727138
-
-
Fomenkov, I.1
Brandt, D.2
Bykanov, A.3
Ershov, A.4
Partlo, W.5
Myers, D.6
Bwering, N.7
Farrar, N.8
Vaschenko, G.9
Khodykin, O.10
-
21
-
-
79955458431
-
-
D. Brandt, I. Fomenkov, A. Ershov, W. Partlo, D. Myers, D. Brown, R. Sandstrom, B. LaFontaine, A. Bykanov, G. Vaschenko, O. Khodykin, N. Bowering, P. Das, V. Fleurov, K. Zhang, S. Srivastava, I. Ahmad, C. Rajyaguru, S. De Dea, R. Hou, W. Dunstan, P. Baumgart, T. Isihara, R. Simmons, R. Jacques, and R. Bergstedt, presented at the International Symposium on Extreme Ultraviolet Lithography, Kobe, Japan, 2010.
-
(2010)
International Symposium on Extreme Ultraviolet Lithography, Kobe, Japan
-
-
Brandt, D.1
Fomenkov, I.2
Ershov, A.3
Partlo, W.4
Myers, D.5
Brown, D.6
Sandstrom, R.7
Lafontaine, B.8
Bykanov, A.9
Vaschenko, G.10
Khodykin, O.11
Bowering, N.12
Das, P.13
Fleurov, V.14
Zhang, K.15
Srivastava, S.16
Ahmad, I.17
Rajyaguru, C.18
De Dea, S.19
Hou, R.20
Dunstan, W.21
Baumgart, P.22
Isihara, T.23
Simmons, R.24
Jacques, R.25
Bergstedt, R.26
more..
-
22
-
-
46049111206
-
-
10.1063/1.2951595
-
Y. Tao, M. S. Tillack, K. L. Sequoia, R. A. Burdt, S. Yuspeh, and F. Najmabadi, Appl. Phys. Lett. 92, 251501 (2008). 10.1063/1.2951595
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 251501
-
-
Tao, Y.1
Tillack, M.S.2
Sequoia, K.L.3
Burdt, R.A.4
Yuspeh, S.5
Najmabadi, F.6
|