Interaction of a CO2 laser pulse with tin-based plasma for an extreme ultraviolet lithography source

IEEE Transactions on Plasma Science

Volumn 38, Issue 4 PART 2, 2010, Pages 714-718

  Tao, Yezheng ^a   Tillack, Mark S ^a   Yuspeh, Sam ^a   Burdt, Russell A ^a   Shaikh, Nek M ^b   Amin, Nasir ^a,c   Najmabadi, Farrokh ^a  

^a UNIVERSITY OF CALIFORNIA SAN DIEGO   (United States)

^b UNIVERSITY OF SINDH   (Pakistan)

^c UNIVERSITY OF AGRICULTURE   (Pakistan)

Author keywords

CO2 laser; Extreme ultraviolet (EUV) source; Plasma

Indexed keywords

EUV EMISSIONS; EXTREME ULTRAVIOLET (EUV) SOURCE; EXTREME ULTRAVIOLET SOURCES; IN-BAND; LOW CONCENTRATIONS; ND : YAG LASERS; SURFACE IMPURITIES; TARGET SURFACE; THINNER LAYERS;

CONVERSION EFFICIENCY; LASER PULSES; NEODYMIUM; PHOTOLITHOGRAPHY; PLASMA CONFINEMENT; PULSED LASER APPLICATIONS; TARGETS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET DEVICES; ULTRAVIOLET LASERS;

NEODYMIUM LASERS;

EID: 77951093571     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2034379     Document Type: Conference Paper

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