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Volumn 99, Issue 23, 2011, Pages

Gd plasma source modeling at 6.7 nm for future lithography

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC STRUCTURE CALCULATIONS; DISCHARGE-PRODUCED PLASMAS; EXPERIMENTAL SPECTRA; MAXIMUM INTENSITIES; NEXT GENERATION LITHOGRAPHY; OPTICALLY THIN PLASMAS; OPTIMUM TEMPERATURE; PLASMA CONDITIONS; PLASMA MODELING; RESONANCE TRANSITION; SOURCE MODELING;

EID: 83455172737     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3666042     Document Type: Article
Times cited : (35)

References (22)
  • 1
    • 73549094237 scopus 로고    scopus 로고
    • 10.1038/nphoton.2009.251
    • C. Wagner and N. Harned, Nat. Photon. 4, 24 (2010). 10.1038/nphoton.2009. 251
    • (2010) Nat. Photon. , vol.4 , pp. 24
    • Wagner, C.1    Harned, N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.