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Volumn 93, Issue 9, 2008, Pages

Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

Author keywords

[No Author keywords available]

Indexed keywords

CONVERSION EFFICIENCY; DEBRIS; IONS; LASER PULSES; LASERS; LITHIUM ALLOYS; LITHOGRAPHY; MAGNETIC FIELDS; NEODYMIUM LASERS; PULSED LASER APPLICATIONS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET RADIATION;

EID: 51349147516     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2975180     Document Type: Article
Times cited : (14)

References (17)
  • 1
    • 51349158546 scopus 로고    scopus 로고
    • edited by V. Bakshi (SPIE, Washington)
    • EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Washington, 2005), pp. 1-1044.
    • (2005) EUV Sources for Lithography , pp. 1-1044
  • 10
    • 0015658534 scopus 로고
    • 0021-8979 10.1063/1.1662796.
    • D. Colombant and G. F. Tonon, J. Appl. Phys. 0021-8979 10.1063/1.1662796 44, 3524 (1973).
    • (1973) J. Appl. Phys. , vol.44 , pp. 3524
    • Colombant, D.1    Tonon, G.F.2
  • 15
    • 31644441806 scopus 로고    scopus 로고
    • 1070-664X 10.1063/1.2162527.
    • M. Murakami and M. M. Basko, Phys. Plasmas 1070-664X 10.1063/1.2162527 13, 012105 (2006).
    • (2006) Phys. Plasmas , vol.13 , pp. 012105
    • Murakami, M.1    Basko, M.M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.