메뉴 건너뛰기




Volumn 99, Issue 9, 2006, Pages

13.5 nm extreme ultraviolet emission from tin based laser produced plasma sources

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CALIBRATION; ELECTROMAGNETIC WAVE EMISSION; LASER PRODUCED PLASMAS; LASER PULSES; SPECTROGRAPHS; TIN; VACUUM APPLICATIONS;

EID: 33646879868     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2191477     Document Type: Article
Times cited : (68)

References (37)
  • 2
    • 27644576783 scopus 로고    scopus 로고
    • P. Hayden et al., Proc. SPIE 5826, 154 (2005).
    • (2005) Proc. SPIE , vol.5826 , pp. 154
    • Hayden, P.1
  • 6
    • 10644271906 scopus 로고    scopus 로고
    • K. Fahy et al., J. Phys. D 37, 3225 (2004).
    • (2004) J. Phys. D , vol.37 , pp. 3225
    • Fahy, K.1
  • 15
    • 0012086615 scopus 로고    scopus 로고
    • U. Stamm et al., Proc. SPIE 4688, 122 (2002).
    • (2002) Proc. SPIE , vol.4688 , pp. 122
    • Stamm, U.1
  • 25
    • 33646876490 scopus 로고    scopus 로고
    • EUVL Source Workshop, SEMATECH, Miyazaki, Japan
    • K. Ota, EUVL Source Workshop, SEMATECH, Miyazaki, Japan (2004) (unpublished); http://www.sematech.org/resources/litho/meetings/euvl/20041105/ 02_EUV_Source_Requirements_Ota.pdf
    • (2004)
    • Ota, K.1
  • 26
    • 33646873589 scopus 로고    scopus 로고
    • K. Ota, EUVL Source Workshop, SEMATECH, Miyazaki, Japan (2004) (unpublished); http://www.sematech.org/resources/litho/meetings/euvl/20041105/ 02_EUV_Source_Requirements_Ota.pdf


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.