Development of laser-produced plasma based EUV light source technology for HVM EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8322, Issue , 2012, Pages

  Fujimoto, Junichi ^a   Hori, Tsukasa ^b   Yanagida, Tatsuya ^b   Ohta, Takeshi ^b   Kawasuji, Yasufumi ^b   Shiraishi, Yutaka ^b   Abe, Tamotsu ^b   Kodama, Takeshi ^b   Nakarai, Hiroaki ^b   Yamazaki, Taku ^b   Mizoguchi, Hakaru ^a  

^a GIGAPHOTON INC   (Japan)

^b KOMATSU LTD   (Japan)

Author keywords

CO 2 laser; EUV; EUV light source; Laser produced plasma; Lithography

Indexed keywords

13.5 NM; DEBRIS MITIGATION; ENGINEERING DATA; EUV; EUV LIGHT SOURCES; HIGH-POWER; IONIZATION RATES; LASER ENERGY ABSORPTION; NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATIONS; POWER SCALABILITY; PULSE ENERGIES; TEST TOOLS;

CARBON DIOXIDE; DEBRIS; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LITHOGRAPHY; MAGNETIC FIELDS; TIN;

LIGHT SOURCES;

EID: 84861064184     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.916093     Document Type: Conference Paper

References (11)

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