LPP source system development for HVM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Brandt, David C ^a   Fomenkov, Igor V ^a   Ershov, Alex I ^a   Partlo, William N ^a   Myers, David W ^a   Sandstrom, Richard L ^a   La Fontaine, Bruno M ^a   Lercel, Michael J ^a   Bykanov, Alexander N ^a   Böwering, Norbert R ^a   Vaschenko, Georgiy O ^a   Khodykin, Oleh V ^a   Srivastava, Shailendra N ^a   Ahmad, Imtiaz ^a   Rajyaguru, Chirag ^a   Das, Palash ^a   Fleurov, Vladimir B ^a   Zhang, Kevin ^a   Golich, Daniel J ^a   De Dea, Silvia ^a   Hou, Richard R ^a   Dunstan, Wayne J ^a   Wittak, Christian J ^a   Baumgart, Peter ^a   Ishihara, Toshihiko ^a   Simmons, Rod D ^a   Jacques, Robert N ^a   Bergstedt, Robert A ^a   more..

^a CYMER INC   (United States)

Author keywords

EUV lithography; EUV source; Laser Produced Plasma

Indexed keywords

CIRCUIT FEATURES; ELECTRICITY-CONSUMPTION; EUV LITHOGRAPHY; EUV SOURCE; HIGH VOLUME MANUFACTURING; LPP SOURCES; OPTICAL IMAGING; ROADMAP; SCANNER MANUFACTURERS;

EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LIGHT SOURCES; MANUFACTURE; SCANNING; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS; ULTRAVIOLET LASERS;

LITHOGRAPHY;

EID: 79957969034     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.882208     Document Type: Conference Paper

References (7)

1. Fomenkov, I.V., Brandt, D.C., Bykanov, A.N., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Vaschenko, G.O., Khodykin, O.V., Hoffman, J.R., Vargas, E., L., Simmons, R.D., Chavez, J.A., Chrobak, C.P., in: Proc. of SPIE Vol. 6517, Emerging Lithographic Technologies XI, M. J. Lercel, ED., 65173J (2007).
2. Böwering, N.R., Hoffman, J.R., Khodykin, O.V., Rettig, C.L., Hansson, B.A.M., Ershov, A.I., Fomenkov, I.V., in: Proc. SPIE Vol. 5752, Metrology, Inspection, and Process Control for Microlithograpy XIX, R. M. Silver, Ed., 1248-1256 (2005).
3. Brandt, D.C., Fomenkov, I.V., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Bykanov, A.N., Hoffman, J.R., Chrobak, C.P, Srivastava, S.N., Ahmad, I., Rajyaguru, C., Golich, D.J., Vidusek, D.A., De Dea, S., Hou, R.R., in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727103, (2009).
4. Fomenkov, I.V., Brandt, D.C., Bykanov, A.N., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Hoffman, J.R., Chrobak, C.P., Srivastava, S.N., Golich, D.J., Vidusek, D.A., De Dea, S., Hou, R.R., in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727138 (2009).
5. Böwering, N.R., Fomenkov, I.V., Brandt, D.C., Bykanov, A.N., Ershov, A.I., Partlo, W.N., Myers, D.W., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Hoffman, J.R., Chrobak, C.P., Srivastava, S.N., Ahmad, I., Rajyaguru, C., Golich, D.J., Vidusek, D.A., De Dea, S., Hou R.R.,, Journal of Micro/Nanolith. MEMS MOEMS 8(4), 041504 (2009).
6. Fomenkov, I.V., Hansson, B.A.M., Böwering, N.R., Ershov, A.I., Partlo, W.N., Fleurov, V.B., Khodykin, O.V., Bykanov, A.N., Rettig, C.L., Hoffman, J.R., Vargas E.L., Chavez, J.A., Marx, W.F., Brandt, D.C., in: Proc. of SPIE Vol. 6151, Emerging Lithographic Technologies X, M. J. Lercel, Ed., 61513X (2006).
7. Brandt, D.C., Fomenkov, I.V., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Bykanov, A.N., Vaschenko, G.O., Khodykin, O.V., Hoffmann, J. R., Vargas E.L., Simmons, R.D., Chavez, J.A., Chrobak, C.P., in: Proc. of SPIE Vol. 6517, Emerging Lithographic Technologies XI, M. J. Lercel, ED., 65170Q (2007)