EUV lithography at chipmakers has started: Performance validation of ASML's NXE:3100

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7969, Issue , 2011, Pages

  Wagner, Christian ^a   Bacelar, Jose ^a   Harned, Noreen ^a   Loopstra, Erik ^a   Hendriks, Stef ^a   De Jong, Ivo ^a   Kuerz, Peter ^b   Levasier, Leon ^a   Van De Kerkhof, Mark ^a   Lowisch, Martin ^b   Meiling, Hans ^a   Ockwell, David ^a   Peeters, Rudy ^a   Van Setten, Eelco ^a   Stoeldraijer, Judon ^a   Young, Stuart ^a   Zimmerman, John ^a   Kool, Ron ^a  

^a ASML   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

EUV lithography; imaging; masks; resist; Sn source

Indexed keywords

BELGIUM; BUILDING BLOCKES; CHIPMAKERS; DEVICE VERIFICATION; EUV LITHOGRAPHY; EXPOSURE TOOL; HIGH VOLUME MANUFACTURING; IMAGING; IMAGING PERFORMANCE; INTEGRATION PHASE; KEY ELEMENTS; MANUFACTURING FLOW; MODULE PERFORMANCE; NEW YORK , USA; OFF-AXIS ILLUMINATION; PERFORMANCE VALIDATION; PLATFORM CONCEPT; PROCESS INTEGRATION; PRODUCTIVITY PERFORMANCE; RESIST; SEMICONDUCTOR MANUFACTURERS; SINGLE EXPOSURE; SN SOURCE; SOLID VOLUMES;

EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; INTEGRATION; MANUFACTURE; PRODUCTIVITY; RATING; TIN;

LITHOGRAPHY;

EID: 79957954525     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.878603     Document Type: Conference Paper

References (8)

1. H. Meiling et al., "EUV System - Moving towards Production", SPIE Symposium on emerging Lithographic Technologies, 7271 (2009).
2. C. Wagner et al., "EUV into Production with ASML's NXE platform", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography, 7636 (2010).
3. M. Lowisch, et al., "Optics for EUV production", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography, 7636 (2010).
4. P. Naulleau, "Critical challenges for EUV resist materials", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography II, 7972 (2011)
5. J. Hermans, et al., "Progress of EUV Lithography towards adoption in Manufacturing", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography II, 7969 (2011).
6. D. Brandt, et al., "LPP source development for HVM", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography II, 7969 (2011)
7. M. Yoshioka, et al., "Tin DPP source collector module (SoCoMo) ready for integration into Beta scanner", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography II, 7969 (2011)
8. st generation laser-produced plasma source system for HVM EUV Lithography", SPIE Symposium on Extreme Ultraviolet (EUV) Lithography II, 7969 (2011).