Two dimensional expansion effects on angular distribution of 13.5 nm in-band extreme ultraviolet emission from laser-produced Sn plasma

Applied Physics Letters

Volumn 92, Issue 22, 2008, Pages

  Sequoia, K L ^a   Tao, Y ^a   Yuspeh, S ^a   Burdt, R ^a   Tillack, M S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER NETWORKS; LASER PULSES; LASERS; LITHOGRAPHY; PLASMA (HUMAN); PLASMAS; PULSED LASER DEPOSITION; TIN ALLOYS; TWO DIMENSIONAL; ULTRAVIOLET DEVICES; X RAY ANALYSIS;

(I ,J) CONDITIONS; AMERICAN INSTITUTE OF PHYSICS (AIP); DIMENSIONAL EXPANSION; EXTREME ULTRAVIOLET (EUV) EMISSION; IN BAND; LASER-PRODUCED TIN (SN) PLASMA; TWO DIMENSIONAL PLASMA;

ANGULAR DISTRIBUTION;

EID: 44849104224     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2938717     Document Type: Article

References (15)

1. W. Silfvast and N. Ceglio, Appl. Opt. APOPAI 0003-6935 32, 6895 (1993).
2. T. Aota and T. Tomie, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.94.015004 94, 015004 (2005).
3. S. S. Harilal, M. S. Tillack, Y. Tao, and B. O'Shay, Opt. Lett. OPLEDP 0146-9592 10.1364/OL.31.001549 31, 1549 (2006).
4. T. Okuno, S. Fujioka, H. Nishimura, Y. Tao, K. Nagai, Q. Gu, N. Ueda, T. Ando, K. Nishihara, T. Norimatsu, N. Miyanaga, Y. Izawa, K. Mima, A. Sunahara, H. Furukawa, and A. Sasaki, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2195693 88, 161501 (2006).
5. C. Koay, S. George, K. Takenoshita, R. Bernath, E. Fujiwara, M. Richardson, and V. Bakshi, Proc. SPIE PSISDG 0277-786X 10.1117/12.596753 5751, 279 2005.
6. Y. Tao, M. S. Tillack, S. S. Harilal, K. L. Sequoia, and F. Najmabadi, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2426883 101, 023305 (2007).
7. I. Fomenkov, D. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Bowering, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas, R. D. Simmons, J. A. Chavez, and C. P. Chrobak, Proc. SPIE PSISDG 0277-786X 6517, 277 (2007).
8. T. Ando, S. Fujioka, H. Nishimura, N. Ueda, Y. Yasuda, K. Nagai, T. Norimatsu, M. Murakami, K. Nishihara, N. Miyanaga, Y. Izawa, K. Mima, and A. Sunahara, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2361260 89, 151501 (2006).
9. M. Yamaura, S. Uchida, A. Sunahara, Y. Shimada, H. Nishimura, S. Fujioka, T. Okuno, K. Hashimoto, K. Nagai, T. Norimatsu, K. Nishihara, N. Miyanga, Y. Izawa, and C. Yamanaka, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1915507 86, 181107 (2005).
10. K. Nagai, Q. Gu, Z. Gu, T. Okuno, S. Fujioka, H. Nishimura, Y. Tao, Y. Yasuda, M. Nakai, T. Norimatsu, Y. Shimada, M. Yamaura, H. Yoshida, M. Nakatsuka, N. Miyanaga, K. Nishihara, and Y. Izawa, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2180880 88, 094102 (2006).
11. Y. Tao, F. Sohbatzadeh, H. Nishimura, R. Matsui, T. Hibino, T. Okuno, S. Fujioka, K. Nagai, T. Normiatsu, K. Nishihara, N. Miyanaga, Y. Izawa, A. Sunahara, and T Kawamura, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1788878 85, 1919 (2004).
12. P. Hayden, J. White, A. Cummings, P. Dunne, M. Lysaght, N. Murphy, P. Sheridan, and G. O'Sullivan, Microelectron. Eng. MIENEF 0167-9317 10.1016/j.mee.2005.12.032 83, 699 (2006).
13. L. B. Da Silva, T. W. Barbee, Jr., R. Cauble, P. Celliers, D. Ciarlo, S. Libby, R. A. London, D. Matthews, S. Mrowka, J. C. Moreno, D. Ress, J. E. Trebes, A. S. Wan, and F. Weber, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.74.3991 74, 3991 (1995).
14. Y. Tao, S. S. Harilal, M. S. Tillack, K. L. Sequoia, B. O'Shay, and F. Najmabadi, Opt. Lett. OPLEDP 0146-9592 10.1364/OL.31.002492 31, 2492 (2006).
15. Y. Tao, H. Nishimura, S. Fujioka, A. Sunahara, M. Nakai, T. Okuno, N. Ueda, K. Nishihara, N. Miyanaga, and Y. Izawa, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1931825 86, 201501 (2005).