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Volumn 97, Issue 23, 2010, Pages

Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources

(9) Otsuka, Takamitsu a Kilbane, Deirdre b Higashiguchi, Takeshi a Yugami, Noboru a Yatagai, Toyohiko a Jiang, Weihua c Endo, Akira d Dunne, Padraig b O'Sullivan, Gerry b

a UTSUNOMIYA UNIVERSITY (Japan)

b UNIVERSITY COLLEGE DUBLIN (Ireland)

c NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

1064 NM; ELECTRON DENSITIES; EXTREME ULTRAVIOLET SOURCES; INITIAL DENSITY; LASER INTENSITIES; LASER WAVELENGTH; OPERATING WAVELENGTH; PEAK EMISSIONS; SPECTRAL BEHAVIORS; SPECTRAL PURITY; SYSTEMATIC INVESTIGATIONS; TARGET DENSITY;

ABSORPTION; CONVERSION EFFICIENCY;

ULTRAVIOLET LASERS;

EID: 78650340758 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3526383 Document Type: Article

Times cited : (55)

References (22)

1
- 84960259042
- (SPIE, Washington), Cha. 10.1117/3.613774
- V. Bakshi, EUV Sources for Lithography (SPIE, Washington, 2006), Chap.. 10.1117/3.613774
- (2006) EUV Sources for Lithography
- Bakshi, V.¹

2
- 78650409111
- See: for Fraunhoffer IOF Annual Report 2007.
- See: http://www.iof.fraunhofer.de/index-d.html for Fraunhoffer IOF Annual Report 2007.

3
- 78650413203
- (EUV Litho Inc., Maui, HI)
- J. Benschop, Proceedings of the 2010 International Workshop on EUVL (EUV Litho Inc., Maui, HI, 2010).
- (2010) Proceedings of the 2010 International Workshop on EUVL
- Benschop, J.¹

4
- 0000130079
- JVTBD9 1071-1023,. 10.1116/1.590453
- C. W. Gwyn, R. Stulen, D. Sweeney, and D. Attwood, J. Vac. Sci. Technol. B JVTBD9 1071-1023 16, 3142 (1998). 10.1116/1.590453
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3142
- Gwyn, C.W.¹ Stulen, R.² Sweeney, D.³ Attwood, D.⁴

5
- 28844474834
- PRLTAO 0031-9007,. 10.1103/PhysRevLett.95.235004
- S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa, and K. Mima, Phys. Rev. Lett. PRLTAO 0031-9007 95, 235004 (2005). 10.1103/PhysRevLett. 95.235004
- (2005) Phys. Rev. Lett. , vol.95 , pp. 235004
- Fujioka, S.¹ Nishimura, H.² Nishihara, K.³ Sasaki, A.⁴ Sunahara, A.⁵ Okuno, T.⁶ Ueda, N.⁷ Ando, T.⁸ Tao, Y.⁹ Shimada, Y.¹⁰ Hashimoto, K.¹¹ Yamaura, M.¹² Shigemori, K.¹³ Nakai, M.¹⁴ Nagai, K.¹⁵ Norimatsu, T.¹⁶ Nishikawa, T.¹⁷ Miyanaga, N.¹⁸ Izawa, Y.¹⁹ Mima, K.²⁰ more..

6
- 23744482333
- APPLAB 0003-6951,. 10.1063/1.1989441
- H. Tanaka, A. Matsumoto, K. Akinaga, A. Takahashi, and T. Okada, Appl. Phys. Lett. APPLAB 0003-6951 87, 041503 (2005). 10.1063/1.1989441
- (2005) Appl. Phys. Lett. , vol.87 , pp. 041503
- Tanaka, H.¹ Matsumoto, A.² Akinaga, K.³ Takahashi, A.⁴ Okada, T.⁵

7
- 33646873914
- APPLAB 0003-6951,. 10.1063/1.2206131
- T. Higashiguchi, N. Dojyo, M. Hamada, W. Sasaki, and S. Kubodera, Appl. Phys. Lett. APPLAB 0003-6951 88, 201503 (2006). 10.1063/1.2206131
- (2006) Appl. Phys. Lett. , vol.88 , pp. 201503
- Higashiguchi, T.¹ Dojyo, N.² Hamada, M.³ Sasaki, W.⁴ Kubodera, S.⁵

8
- 36849083445
- APPLAB 0003-6951,. 10.1063/1.2820451
- Y. Ueno, G. Soumagne, A. Sumitani, A. Endo, and T. Higashiguchi, Appl. Phys. Lett. APPLAB 0003-6951 91, 231501 (2007). 10.1063/1.2820451
- (2007) Appl. Phys. Lett. , vol.91 , pp. 231501
- Ueno, Y.¹ Soumagne, G.² Sumitani, A.³ Endo, A.⁴ Higashiguchi, T.⁵

9
- 33646879868
- JAPIAU 0021-8979,. 10.1063/1.2191477
- P. Hayden, A. Cummings, N. Murphy, G. O'Sullivan, P. Sheridan, J. White, and P. Dunne, J. Appl. Phys. JAPIAU 0021-8979 99, 093302 (2006). 10.1063/1.2191477
- (2006) J. Appl. Phys. , vol.99 , pp. 093302
- Hayden, P.¹ Cummings, A.² Murphy, N.³ O'Sullivan, G.⁴ Sheridan, P.⁵ White, J.⁶ Dunne, P.⁷

10
- 45749153359
- APPLAB 0003-6951,. 10.1063/1.2948874
- S. Fujioka, M. Shimomura, Y. Shimada, S. Maeda, H. Sakaguchi, Y. Nakai, T. Aota, H. Nishimura, N. Ozaki, A. Sunahara, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. APPLAB 0003-6951 92, 241502 (2008). 10.1063/1.2948874
- (2008) Appl. Phys. Lett. , vol.92 , pp. 241502
- Fujioka, S.¹ Shimomura, M.² Shimada, Y.³ Maeda, S.⁴ Sakaguchi, H.⁵ Nakai, Y.⁶ Aota, T.⁷ Nishimura, H.⁸ Ozaki, N.⁹ Sunahara, A.¹⁰ Nishihara, K.¹¹ Miyanaga, N.¹² Izawa, Y.¹³ Mima, K.¹⁴

11
- 26344479395
- PLRAAN 1050-2947,. 10.1103/PhysRevA.25.275
- P. K. Carroll and G. O'Sullivan, Phys. Rev. A PLRAAN 1050-2947 25, 275 (1982). 10.1103/PhysRevA.25.275
- (1982) Phys. Rev. A , vol.25 , pp. 275
- Carroll, P.K.¹ O'Sullivan, G.²

12
- 0019542231
- JOSAAH 0030-3941,. 10.1364/JOSA.71.000227
- G. O'Sullivan and P. K. Carroll, J. Opt. Soc. Am. JOSAAH 0030-3941 71, 227 (1981). 10.1364/JOSA.71.000227
- (1981) J. Opt. Soc. Am. , vol.71 , pp. 227
- O'Sullivan, G.¹ Carroll, P.K.²

13
- 33646415749
- JAPIAU 0021-8979,. 10.1063/1.356339
- G. M. Zeng, H. Daido, T. Nishikawa, H. Takabe, S. Nakayama, H. Aritome, K. Murai, Y. Kato, M. Nakatsuka, and S. Nakai, J. Appl. Phys. JAPIAU 0021-8979 75, 1923 (1994). 10.1063/1.356339
- (1994) J. Appl. Phys. , vol.75 , pp. 1923
- Zeng, G.M.¹ Daido, H.² Nishikawa, T.³ Takabe, H.⁴ Nakayama, S.⁵ Aritome, H.⁶ Murai, K.⁷ Kato, Y.⁸ Nakatsuka, M.⁹ Nakai, S.¹⁰

14
- 70450206676
- PHSTBO 0031-8949,. 10.1088/0031-8949/80/04/045303
- S. S. Churilov, R. R. Kildiyarova, A. N. Ryabtsev, and S. V. Sadovsky, Phys. Scr. PHSTBO 0031-8949 80, 045303 (2009). 10.1088/0031-8949/80/04/045303
- (2009) Phys. Scr. , vol.80 , pp. 045303
- Churilov, S.S.¹ Kildiyarova, R.R.² Ryabtsev, A.N.³ Sadovsky, S.V.⁴

15
- 77956807947
- APPLAB 0003-6951,. 10.1063/1.3490704
- T. Otsuka, D. Kilbane, J. White, T. Higashiguchi, N. Yugami, T. Yatagai, W. Jiang, A. Endo, P. Dunne, and G. O'Sullivan, Appl. Phys. Lett. APPLAB 0003-6951 97, 111503 (2010). 10.1063/1.3490704
- (2010) Appl. Phys. Lett. , vol.97 , pp. 111503
- Otsuka, T.¹ Kilbane, D.² White, J.³ Higashiguchi, T.⁴ Yugami, N.⁵ Yatagai, T.⁶ Jiang, W.⁷ Endo, A.⁸ Dunne, P.⁹ O'Sullivan, G.¹⁰

16
- 3342951183
- OPEGAR 0091-3286,. 10.1117/12.184381
- G. O'Sullivan and R. Faulkner, Opt. Eng. OPEGAR 0091-3286 33, 3993 (1994). 10.1117/12.184381
- (1994) Opt. Eng. , vol.33 , pp. 3993
- O'Sullivan, G.¹ Faulkner, R.²

17
- 33750529952
- OPLEDP 0146-9592,. 10.1364/OL.31.002517
- G. Mordovanakis, K. -C. Hou, Y. -C. Chang, M. -Y. Cheng, J. Nees, B. Hou, A. Maksimchuk, G. Mourou, A. Galvanauskas, and B. Lafontain, Opt. Lett. OPLEDP 0146-9592 31, 2517 (2006). 10.1364/OL.31.002517
- (2006) Opt. Lett. , vol.31 , pp. 2517
- Mordovanakis, G.¹ Hou, K.-C.² Chang, Y.-C.³ Cheng, M.-Y.⁴ Nees, J.⁵ Hou, B.⁶ Maksimchuk, A.⁷ Mourou, G.⁸ Galvanauskas, A.⁹ Lafontain, B.¹⁰

18
- 34247874741
- APPLAB 0003-6951,. 10.1063/1.2735944
- J. White, P. Dunne, P. Hayden, F. O'Reilly, and G. O'Sullivan, Appl. Phys. Lett. APPLAB 0003-6951 90, 181502 (2007). 10.1063/1.2735944
- (2007) Appl. Phys. Lett. , vol.90 , pp. 181502
- White, J.¹ Dunne, P.² Hayden, P.³ O'Reilly, F.⁴ O'Sullivan, G.⁵

19
- 33646187983
- APPLAB 0003-6951,. 10.1063/1.2195904
- T. Higashiguchi, K. Kawasaki, W. Sasaki, and S. Kubodera, Appl. Phys. Lett. APPLAB 0003-6951 88, 161502 (2006). 10.1063/1.2195904
- (2006) Appl. Phys. Lett. , vol.88 , pp. 161502
- Higashiguchi, T.¹ Kawasaki, K.² Sasaki, W.³ Kubodera, S.⁴

20
- 20444496525
- APPLAB 0003-6951,. 10.1063/1.1834994
- A. Sasaki, K. Nishihara, M. Murakami, F. Koike, T. Kagawa, T. Nishikawa, K. Fujima, T. Kawamura, and H. Furukawa, Appl. Phys. Lett. APPLAB 0003-6951 85, 5857 (2004). 10.1063/1.1834994
- (2004) Appl. Phys. Lett. , vol.85 , pp. 5857
- Sasaki, A.¹ Nishihara, K.² Murakami, M.³ Koike, F.⁴ Kagawa, T.⁵ Nishikawa, T.⁶ Fujima, K.⁷ Kawamura, T.⁸ Furukawa, H.⁹

21
- 22144478296
- APPLAB 0003-6951,. 10.1063/1.1968415
- S. Miyamoto, A. Shimoura, S. Amano, K. Fukugaki, H. Kinugasa, T. Inoue, and T. Mochizuki, Appl. Phys. Lett. APPLAB 0003-6951 86, 261502 (2005). 10.1063/1.1968415
- (2005) Appl. Phys. Lett. , vol.86 , pp. 261502
- Miyamoto, S.¹ Shimoura, A.² Amano, S.³ Fukugaki, K.⁴ Kinugasa, H.⁵ Inoue, T.⁶ Mochizuki, T.⁷

22
- 33646167687
- APPLAB 0003-6951,. 10.1063/1.2195693
- T. Okuno, S. Fujioka, H. Nishimura, Y. Tao, K. Nagai, Q. Gu, N. Ueda, T. Ando, K. Nishihara, T. Norimatsu, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. APPLAB 0003-6951 88, 161501 (2006). 10.1063/1.2195693
- (2006) Appl. Phys. Lett. , vol.88 , pp. 161501
- Okuno, T.¹ Fujioka, S.² Nishimura, H.³ Tao, Y.⁴ Nagai, K.⁵ Gu, Q.⁶ Ueda, N.⁷ Ando, T.⁸ Nishihara, K.⁹ Norimatsu, T.¹⁰ Miyanaga, N.¹¹ Izawa, Y.¹² Mima, K.¹³

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