Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production

Applied Physics Letters

Volumn 92, Issue 24, 2008, Pages

  Fujioka, Shinsuke ^a   Shimomura, Masashi ^a   Shimada, Yoshinori ^b   Maeda, Shinsuke ^a   Sakaguchi, Hirokazu ^a   Nakai, Yuki ^a   Aota, Tatsuya ^a   Nishimura, Hiroaki ^a   Ozaki, Norimasa ^a   Sunahara, Atsushi ^b   Nishihara, Katsunobu ^a   Miyanaga, Noriaki ^a   Izawa, Yasukazu ^a   Mima, Kunioki ^a  

^a OSAKA UNIVERSITY   (Japan)

^b INSTITUTE FOR LASER TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HARMONIC GENERATION; LASER BEAMS; LASERS; LIGHT; LIGHT SOURCES; LIGHTING; PULSED LASER DEPOSITION; TIN; TINNING; TITANIUM COMPOUNDS; ULTRAVIOLET DEVICES; ULTRAVIOLET RADIATION;

EXTREME ULTRA-VIOLET (EUV); LASER PREPULSE; LASER SPOTS; MICRO-DROPLETS; RADIANT ENERGY;

PULSED LASER APPLICATIONS;

EID: 45749153359     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2948874     Document Type: Article

References (21)

1. EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Bellingham, WA, 2005).
2. R. C. Spitzer, T. J. Orzechowski, D. W. Phillion, R. L. Kauffman, and C. Cerjan, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.361149 79, 2251 (1996).
3. M. Richardson, G.-S. Koay, K. Takenoshita, C. Keyser, and M. Al-Rabban, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1667511 22, 785 (2004).
4. Y. Shimada, H. Nishimura, M. Nakai, K. Hashimoto, M. Yamaura, Y. Tao, K. Shigemori, T. Okuno, K. Nishihara, T. Kawamura, A. Sunahara, T. Nishikawa, A. Sasaki, K. Nagai, T. Norimatsu, S. Fujioka, S. Uchida, N. Miyanaga, Y. Izawa, and C. Yamanaka, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1856697 86, 051501 (2005).
5. S. Fujioka, H. Nishimura, K. Nishihara, A. Sasaki, A. Sunahara, T. Okuno, N. Ueda, T. Ando, Y. Tao, Y. Shimada, K. Hashimoto, M. Yamaura, K. Shigemori, M. Nakai, K. Nagai, T. Norimatsu, T. Nishikawa, N. Miyanaga, Y. Izawa, and K. Mima, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.95.235004 95, 235004 (2005).
6. H. Tanaka, A. Matsumoto, K. Akinaga, A. Takahashi, and T. Okada, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1989441 87, 041503 (2005).
7. K. Nishihara, A. Sasaki, A. Sunahara, and T. Nishikawa, EUV Sources for Lithography (SPIE, Bellingham, WA, 2006), Vol. PM149, Chap., p. 339.
8. T. Ando, S. Fujioka, H. Nishimura, T. Aota, N. Ueda, M. Shimomura, H. Sakaguchi, Y. Yasuda, K. Nagai, T. Norimatsu, M. Murakami, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2361260 89, 151501 (2006).
9. J. White, G. O'Sullivan, S. Zakharov, P. Choi, V. Zakharov, H. Nishimura, S. Fujioka, and K. Nishihara, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2906901 92, 151501 (2008).
10. S. Fujioka, H. Nishimura, K. Nishihara, Y.-G. Kang, Y. Shimada, A. Sunahara, H. Furukawa, Q. Gu, K. Nagai, T. Norimatsu, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2142102 87, 241503 (2005).
11. S. Namba, S. Fujioka, H. Nishimura, Y. Yasuda, K. Nagai, N. Miyanaga, Y. Izawa, K. Mima, and K. Takiyama, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2199494 88, 171503 (2006).
12. H. Tanaka, Y. Hashimoto, K. Tamaru, A. Takahashi, and T. Okada, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2362591 89, 181109 (2006).
13. M. Shimomura, S. Fujioka, T. Ando, H. Sakaguchi, Y. Nakai, Y. Yasuda, H. Nishimura, K. Nagai, T. Norimatsu, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Express APECE4 1882-0778 10.1143/APEX.1.056001 1, 056001 (2008).
14. H. Sakaguchi, S. Fujioka, S. Namba, H. Tanuma, H. Ohashi, S. Suda, M. Shimomura, Y. Nakai, Y. Kimura, Y. Yasuda, H. Nishimura, T. Norimatsu, A. Sunahara, K. Nishihara, N. Miyanaga, Y. Izawa, and K. Mima, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2901875 92, 111503 (2008).
15. Y. Ueno, G. Soumagne, A. Sumitani, A. Endo, and T. Higashiguchi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2820451 91, 231501 (2007).
16. R. Kodama, T. Mochizuki, K. A. Tanaka, and C. Yamanaka, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.98078 50, 720 (1987).
17. F. Bijkerk, G. Hergenhan, G. Schriever, K. Gabel, M. Schuermann, R. de Bruijn, S. A. van der Westen, T. Missalla, U. Stamm, and V. Bakshi, Technical Report No. 04024498A-TR, International SEMATECH Manufacturing Initiative (2004); URL: http://www.sematech.org/docubase/abstracts/4498atr.htm.
18. Y. Tao, M. Nakai, H. Nishimura, S. Fujioka, T. Okuno, T. Fujiwara, N. Ueda, N. Miyanaga, and Y. Izawa, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.1818891 75, 5173 (2005).
19. K. Nishihara, A. Sunahara, A. Sasaki, M. Nunami, H. Tanuma, S. Fujioka, Y. Shimada, K. Fujima, H. Furukawa, T. Kato, F. Koike, R. More, M. Murakami, T. Nishikawa, V. Zhakhovskii, K. Gamata, A. Takata, H. Ueda, H. Nishimura, Y. Izawa, N. Miyanaga, and K. Mima, Phys. Plasmas PHPAEN 1070-664X 10.1063/1.2907154 15, 056708 (2008).
20. A. Endo, H. Hoshino, T. Suganuma, K. Nowak, T. Yamagida, T. Yabu, T. Asayama, Y. Ueno, M. Moriya, M. Nakano, H. Someya, T. Nishisaka, T. Abe, G. Soumagne, H. Komori, H. Mizoguchi, A. Sumitani, and K. Toyoda, 2007 International EUVL Symposium, Sapporo, Japan, 2007 (unpublished), p. SO-07.
21. D. C. Brandt, I. V. Fomenkov, N. R. Bowering, A. I. Ershov, W. N. Partlo, D. W. Myers, G. O. Vaschnko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, C. P. Chrobak, J. A. Chavez, R. D. Simmons, and A. Hsu, 2007 International EUVL Symposium, Sapporo, Japan, 2007 (unpublished), p. SO-06.