Extreme ultraviolet source at 6.7 nm based on a low-density plasma

Applied Physics Letters

Volumn 99, Issue 19, 2011, Pages

  Higashiguchi, Takeshi ^a,b   Otsuka, Takamitsu ^a   Yugami, Noboru ^a,b   Jiang, Weihua ^c   Endo, Akira ^d   Li, Bowen ^e   Kilbane, Deirdre ^e   Dunne, Padraig ^e   O'Sullivan, Gerry ^e  

^a UTSUNOMIYA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

^d WASEDA UNIVERSITY   (Japan)

^e UNIVERSITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET SOURCES; INITIAL DENSITY; LASER PULSE IRRADIATION; LOW-DENSITY PLASMAS; OPTICAL THICKNESS; SELF-ABSORPTION EFFECTS; SOLID DENSITY TARGETS;

CONVERSION EFFICIENCY; GADOLINIUM; PLASMAS;

ULTRAVIOLET DEVICES;

EID: 81155144651     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3660275     Document Type: Article

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