Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 3, 2011, Pages

  Malloy, Matt ^a   Litt, Lloyd C ^a  

^a SEMATECH   (United States)

Author keywords

Jet and flash; Jet and flash imprint lithography; Nanoimprint; Patterned media; Step and flash; Step and flash imprint lithography

Indexed keywords

CRITICAL INFRASTRUCTURES; FLASH MEMORY; HARD DISK STORAGE; MANUFACTURE; SEMICONDUCTOR DEVICES; TECHNOLOGY; VIRTUAL STORAGE;

CONTACT LITHOGRAPHY; CRITICAL CHALLENGES; CRITICAL DIMENSION UNIFORMITIES; CURRENT STATUS; DEFECTIVITY; END USERS; FLASH IMPRINT LITHOGRAPHY; GENERATION TOOLS; HARD DISK DRIVE; HIGH VOLUME MANUFACTURING; INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS; LINEWIDTH ROUGHNESS; NANO-IMPRINT; PATTERNED MEDIAS; RESOLUTION REQUIREMENTS; SMALL FEATURES; STEP AND FLASH; STEP AND FLASH IMPRINT LITHOGRAPHY; TECHNOLOGY REVIEW;

NANOIMPRINT LITHOGRAPHY;

EID: 80055031753     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3642641     Document Type: Review

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