Automated imprint mask cleaning for Step-and-Flash Imprint Lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Singh, Sherjang ^a   Chen, Ssuwei ^a   Selinidis, Kosta ^c   Fletcher, Brian ^c   McMackin, Ian ^c   Thompson, Ecron ^c   Resnick, Douglas J ^c   Dress, Peter ^b   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b HamaTech APE GmbHandKoKG ^*  (Germany)

^c MOLECULAR IMPRINTS INC   (United States)

Author keywords

CD change; Cleaning; Imprint mask; Nanoimprint; S FIL; Step and flash imprint lithography; Template

Indexed keywords

CD CHANGE; IMPRINT MASK; NANOIMPRINT; S-FIL; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE;

COBALT COMPOUNDS; DATA STORAGE EQUIPMENT; PHOTOMASKS; PHOTORESISTS; SURFACE CLEANING; TECHNOLOGY; VISCOSITY OF LIQUIDS;

NANOIMPRINT LITHOGRAPHY;

EID: 67149145253     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814290     Document Type: Conference Paper

References (12)

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12. st international conference on electron, ion, and photon beam technology & nanofabrication, Denver, Colorado, May 29 - June 1, 2007