SCOPUS 정보 검색 플랫폼

Volumn 7970, Issue , 2011, Pages

Jet and flash imprint defectivity - Assessment and reduction for semiconductor applications

Author keywords

Defectivity; HVM; J FIL; Jet and flash imprint lithography; Molecular Imprints; Nanoimprint; NIL; S FIL; Step and flash imprint lithography

Indexed keywords

DEFECTIVITY; HVM; J-FIL; MOLECULAR IMPRINT; NANO-IMPRINT; NIL; S-FIL; STEP AND FLASH IMPRINT LITHOGRAPHY;

DEFECTS; MOLECULAR MODELING; RATING; SEMICONDUCTOR DEVICE MANUFACTURE;

NANOIMPRINT LITHOGRAPHY;

EID: 79955904144 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.881530 Document Type: Conference Paper

Times cited : (7)

References (9)

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9
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- Assessing EUV mask defectivity
- U. Okoroanyanwu, A. Tchikoulaeva, P. Ackmann, O. Wood, B. LaFontaine, K. Bubke, C. Holfeld, J. Peters, S. Kini, S. Watson, I. Lee, B. Mu, P. Lim, S. Raghunathan, C. Boye, "Assessing EUV Mask Defectivity," Proc. of SPIE, Vol 7636, 2010.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.