Imprint lithography: Lab curiosity or the real NGL?

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 12-23

  Resnick, D J ^a   Dauksher, W J ^a   Mancini, D ^a   Nordquist, K J ^a   Bailey, T C ^b   Johnson, S ^b   Stacey, N ^b   Ekerdt, J G ^b   Willson, C G ^b   Sreenivasan, S V ^c   Schumaker, N ^c  

^a MOTOROLA INC   (United States)

^b The University of Texas at Austin   (United States)

^c MOLECULAR IMPRINTS INC   (United States)

Author keywords

Flash; Imprint; Lithography; NIL; Step; UV NIL

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; INTEGRATED CIRCUIT MANUFACTURE; MASKS; NANOTECHNOLOGY; PHOTORESISTS; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION;

NEXT GENERATION LITHOGRAPHY; STEP AND FLASH IMPRINT LITHOGRAPHY; ULTRAVIOLET NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0141836181     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.490126     Document Type: Conference Paper

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