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Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 6, 2010, Pages

45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation

(3) Hiroshima, Hiroshi a,b Wang, Qing a,b Youn, Sung Won a,b

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; SCANNING ELECTRON MICROSCOPY; SURFACE DEFECTS; THICK FILMS;

BUBBLE DEFECTS; CAPILLARY PRESSURES; COLOR UNIFORMITY; GAS CONDENSATION; LINE-AND-SPACE; LINE/SPACE PATTERNING; PATTERN SIZE; PENTAFLUOROPROPANE; RESIDUAL LAYER THICKNESS; RESIDUAL LAYERS; SCANNING ELECTRON MICROSCOPE; SPIN-COAT FILM; UV-CURABLE RESINS; UV-NANOIMPRINT;

RESINS;

EID: 78650084923 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3507882 Document Type: Article

Times cited : (16)

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