High resolution nanoimprint templates for dual damascene - Fabrication and imprint results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Irmscher, Mathias ^a   Butschke, Joerg ^a   Carpio, Ron ^b   Chao, Brook ^c   Jen, Wei Lun ^c   Koepernik, Corinna ^a   Nedelmann, Lorenz ^a   Owens, Jordan ^b   Palmieri, Frank ^c   Pritschow, Marcus ^a   Reuter, Christian ^a   Sailer, Holger ^a   Sotoodeh, Ken ^b   Wetzel, Jeff ^b   Wilks, Bruce ^b   Willson, Grant ^c  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b ATDF   (United States)

^c UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

CAR; Dual damascene; E beam; Template; UV nanoimprint; VSB

Indexed keywords

CAR; DUAL DAMASCENE; E-BEAM; TEMPLATE; UV-NANOIMPRINT; VSB;

AUTOMOBILE MANUFACTURE; DESIGN; ELECTRON BEAM LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY;

FABRICATION;

EID: 79959365745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772295     Document Type: Conference Paper

References (5)

1. ITRS Roadmap, Edition 2005
2. M. Melliar-Smith "Lithography beyond 32nm: a role for imprint", Plenary presentation SPIE Advanced Lithography Conference 2007
3. Ikuo Yoneda, Shinji Mikami, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki, "Nanoimprint applications toward 22nm node CMOS devices", MNE 2007, Copenhagen, Denmark
4. S. MacDonald, G. Hughes, M. Stewart, F. Palmieri, C. Willson "Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting", Proc. SPIE Vol. 5992, 59922F, 2005
5. Jun Yashima et.al. "Electron-beam mask writer EBM-6000 for 45nm HP node", Photomask Japan 2007, Yokohama, Japan