The comparison of NGLs from a tool vendor's view

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

  Suzuki, Akiyoshi ^a  

^a CANON INC   (Japan)

Author keywords

Double patterning; EUVL; Lithography; Nanoimprint; NGL

Indexed keywords

DIRECT CONTACT; DIRECT COOLING; DOUBLE PATTERNING; EUVL; EXPOSURE TOOL; FINE RESOLUTION; FUNDAMENTAL ANALYSIS; HEATING EFFECT; MEMORY APPLICATIONS; NANO-IMPRINT; NANOIMPRINT TECHNOLOGY; NGL; OFF-AXIS ILLUMINATION; OPTICAL LITHOGRAPHY; PARADIGM SHIFTS; PATTERN FIDELITY; PRE-PRODUCTION; RETICLE PATTERN; SYSTEMATIC OPTIMIZATION; TIME DEPENDENT; VOLUME-PRODUCTION;

EXPOSURE METERS; HEATING; NANOIMPRINT LITHOGRAPHY; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; TECHNOLOGY;

EQUIPMENT;

EID: 79955908266     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881274     Document Type: Conference Paper

References (11)

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