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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7970, Issue , 2011, Pages

Defect reduction of high-density full-field patterns in Jet and Flash Imprint Lithography

(9) Singh, Lovejeet a Luo, Kang a Ye, Zhengmao a Xu, Frank a Haase, Gaddi a Curran, David a La Brake, Dwayne a Resnick, Douglas a Sreenivasan, S V a

a MOLECULAR IMPRINTS INC (United States)

Author keywords

Defectivity; Imprint Lithography; Imprint mask; J FIL; Jet and Flash Imprint Lithography; Non fill defect; Optical inspection; Repeater defect; Template

Indexed keywords

DEFECTIVITY; IMPRINT LITHOGRAPHY; IMPRINT MASK; J-FIL; NON-FILL DEFECT; OPTICAL INSPECTION; REPEATER DEFECT; TEMPLATE;

DEFECT DENSITY; DEFECTS; FILLING; FLASH MEMORY; INSPECTION; OPTICAL TESTING; RESIN TRANSFER MOLDING; SUBSTRATES; ULTRAVIOLET RADIATION;

NANOIMPRINT LITHOGRAPHY;

EID: 79955900891 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.879933 Document Type: Conference Paper

Times cited : (10)

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