Layer-to-layer alignment for step and flash imprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 436-442

  Choi, B J ^a   Meissl, M ^a   Colburn, M ^a   Bailey, T ^a   Ruchhoeft, P ^a,b   Sreenivasan, S V ^a   Prins, F ^a   Banerjee, S ^a   Ekerdt, J G ^a   Willson, C G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

Alignment; Overlay; Step and Flash Imprint Lithography

Indexed keywords

ERROR COMPENSATION; IRRADIATION; SILICON WAFERS; SPIN COATING; ULTRAVIOLET RADIATION; VISCOSITY;

STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

LITHOGRAPHY;

EID: 0010226283     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436662     Document Type: Article

References (10)

1. Soft lithography
2. Nanoimprint lithography
3. 2 surface using self-assembled monomlayers
4. Step and flash imprint lithography for sub-100 nm patterning
5. Novel alignment system for imprint lithography
6. Design of template alignment stages for step & flash imprint lithography
7. Step and flash imprint lithography: Template surface treatment and defect analysis
8. Multilevel nanoimprint lithography with submicron alignment on 4 "Wafers"
9. Application of interferometric broadband imaging alignment on an experimental x-ray stepper