Advanced lithography for bit patterned media

IEEE Transactions on Magnetics

Volumn 45, Issue 2, 2009, Pages 833-838

  Yang, Xiaomin ^a   Xu, Yuan ^a   Lee, Kim ^b   Xiao, Shuaigang ^a   Kuo, David ^b   Weller, Dieter ^b  

^a SEAGATE RESEARCH   (United States)

^b SEAGATE TECHNOLOGY   (United States)

Author keywords

Advanced lithography; Bit patterned media; Directed self assembly; Nanoimprint lithography

Indexed keywords

DEFECTS; PHOTORESISTS;

ADVANCED LITHOGRAPHY; BIT-PATTERNED MEDIA; BIT-PATTERNED MEDIA (BPM); COMMERCIAL AVAILABILITY; DIRECTED SELF-ASSEMBLY; PLACEMENT ACCURACY; POLYMER SELF-ASSEMBLY; RESOLUTION ENHANCEMENT;

NANOIMPRINT LITHOGRAPHY;

EID: 60449108075     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2008.2010647     Document Type: Article

References (16)

1. C. Ross, "Patterned magnetic recording media," Ann. Rev. Mater. Res., vol. 31, pp. 203-235, 2001.
2. R. Service, "Is the terabit within reach'?," Science, vol. 314, pp. 1868-1870, 2006.
3. D. Resnick et al., "Template fabrication challenges for patterned media.," in Proc. Mater. Res. Soc. Symp., 2007, vol. 961, pp. 0961-002-0961-03.
4. 2 dot patterning using electron beam lithography for bit patterned media.," J. Vac. Sci. Technol B, vol. 25, no. 6, p. 2202, 2007.
5. J. Yang and K. Berggren, "Using high-contrast salty development of hydrogen silsesquioxane for sub-10 nm half-pitch lithography.," J. Vac. Sci. Technol. B, vol. 25, no. 6, pp. 2025-2029, 2007.
6. X.-M. Yang, R. Peters, P. Nealey, H. Solak, and F. Cerrina, "Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates.," Macromolecules, vol. 33, no. 26, pp. 9575-9582, 2000.
7. R. Peter, X.-M. Yang, Q. Wang, J. Pablo, and P. Nealey, "Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication," J. Vac. Sci. Technol. B, vol. 18, no. 6, pp. 3530-3534, 2000.
8. S. Kim, H. Solak, M. Stoykovich, N. Ferrier, J. Pablo, and P. Nealey, "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates." Nature, vol. 424, no. 24, pp. 411-414, 2003.
9. M. Stoykovich, M. Muller, S. Kim, H. Solak, E. Edwards, J. Pablo, and P. Nealey, "Directed assembly of block copolymer blends into nonregular device-oriented structures.," Science, vol. 308, pp. 1142-1146, 2005.
10. R. Ruiz, H. Kang, F. Detcheverry, E. Dobisz, D. Kercher, T. Albrecht, J. de Pablo, and P. Neley, "Density multiplication and improved lithography by directed block copolymer assembly," Science, vol. 321, no. 15, pp. 936-939, 2008.
11. I. Bita, J. Yang, Y. Jung, C. Ross, E. Thomas, and K. Berggren, "Graphoepitaxy of self-assembled block copolymer on two-dimensional periodic patterned templates," Science, vol. 321, no. 3, p. 939, 2008.
12. J. Chen, C. Rettner, D. Sanders, H.-C. Kim, and W. Hinsberg, "Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers.," Adv. Mater., vol. 20, pp. 3155-3158, 2008.
13. 2 patterned media.," Adv. Mater., to be published.
14. 2 and beyond," submitted for publication.
15. X.-M. Yang, Y. Xu, C. Seiler, L. Wan, and S. Xiao, "Toward 1 Td/in.2 nano-imprint lithography for magnetic bit patterned media: Opportunities and challenges.," J. Vac. Sci. Technol. B, vol. 26, no. 6, pp. 2604-2610.
16. H. J. Richter et al., "Recording potential of bit patterned media.," Appl. Phys. Lett., vol. 88, p. 222512, 2006.