Developing quartz wafer mold manufacturing process for patterned media

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Chiba, Tsuyoshi ^a   Fukuda, Masaharu ^a   Ishikawa, Mikio ^a   Itoh, Kimio ^a   Kurihara, Masaaki ^a   Hoga, Morihisa ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Mold; Nanoimprint; Patterned media

Indexed keywords

DRY ETCHING PROCESS; ETCHING CONDITION; FEATURE SIZES; FINE PATTERN; HARD DISK DRIVES; HIGHER RESOLUTION; HOLE PATTERNS; LINE-AND-SPACE; MANUFACTURING PROCESS; MOLD MANUFACTURING; NANOIMPRINT; PATTERNED MEDIA; PATTERNED MEDIAS; QUARTZ ETCHING; QUARTZ WAFERS;

DRY ETCHING; HARD DISK STORAGE; INDUSTRIAL ENGINEERING; MICROELECTROMECHANICAL DEVICES; MOLDS; OXIDE MINERALS; PRODUCTION ENGINEERING; QUARTZ; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 69949112877     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824340     Document Type: Conference Paper

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