Si-mold fabrication for patterned media using high-resolution chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Fukuda, Masaharu ^a   Chiba, Tsuyosi ^a   Ishikawa, Mikio ^a   Itoh, Kimio ^a   Kurihara, Masaaki ^a   Hoga, Morihisa ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

100 kV EB writer; Chemically amplified resists; Mold; Nanoimprint; Primer

Indexed keywords

100 KV-EB WRITER; A-SPOTS; ACCELERATION VOLTAGES; BIT-PATTERNED MEDIA; CHEMICALLY AMPLIFIED RESIST; CHEMICALLY AMPLIFIED RESISTS; FEATURE SIZES; HARD DISK DRIVE; HIGH ACCELERATION; HIGH RESOLUTION; HIGH SENSITIVITY; LOW SENSITIVITY; MOLD FABRICATION; NANOIMPRINT; NANOIMPRINT MOLDS; NEW HIGH; PATTERNED MEDIAS; PRIMER; RESIST PATTERN; SUBSTRATE SURFACE; ZEP520A;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; HARD DISK STORAGE; MOLDS; PHOTORESISTORS; PHOTORESISTS;

NANOIMPRINT LITHOGRAPHY;

EID: 69949143787     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824262     Document Type: Conference Paper

References (2)

1. H. Namatsu et. al., Appl. Phys. Lett. 66, 2655(1995)
2. M. Kurihara et al. J. J. Appl. Phy. to be published