Step and repeat UV nanoimprint lithography tools and processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 222-231

  McMackin, Ian ^a   Choi, Jin ^a   Schumaker, Philip ^a   Van Nguyen, ^a   Xu, Frank ^a   Thompson, Ecron ^a   Babbs, Daniel ^a   Sreenivasan, S V ^a   Watts, Michael ^a   Schumaker, Norman ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; EVAPORATION; MOLDS; MONOMERS; NANOTECHNOLOGY; ULTRAVIOLET RADIATION;

ETCH PROCESS; NANO-REPLICATION TECHNIQUE; NANOIMPRINT LITHOGRAPHY; PROCESS TECHNOLOGY;

LITHOGRAPHY;

EID: 3843107899     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538733     Document Type: Conference Paper

References (10)

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2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography," J. Vac. Sci., Tech. B, 1996.14(6).
3. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography," Solid State Technology, July 2001.
4. S.V. Sreenivasan, C.G. Willson, N.B. Schumaker, D.J. Resnick, "Low-Cost Nanostructure Patterning Using Step and Flash Imprint Lithography," NIST-SPIE Conference on Nanotechnology, Sept. 2002.
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6. M. Bender et al., "Multiple Imprinting in UV based Nanoimprint Lithography: Related Materials Issues," Microelectronic Engineering, 61-62 (2002), pp. 407-413.
7. B. J. Choi, S. Johnson, M. Colburn, S.V. Sreenivasan, C. G. Willson, "Design of Orientation Stages for Step and Flash Imprint Lithography," Journal of Int. Societies for Precision Engineering and Nanotechnology, Volume 25, No. 3, pp. 192-199, July, 2001.
8. Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli Collison, S.V. Sreenivasan, Norman Schumaker, Michael Watts, Ronald Voisin, "Design and Performance of a Step and Repeat Imprinting Machine," Proc. of the SPIE's Int. Symp. on Microlithography: Emerging Lithographic Technologies VU, Santa Clara, CA, February 2003.
9. Ecron Thompson et al., "Fabrication of Step and Flash Imprint Lithography Templates Using Commercial Mask Processes," Proc. of the SPIE's Int. Symp. on Microlithography: Emerging Lithographic Technologies VII, Santa Clara, CA, February 2003.
10. S. C. Johnson et al., "Step and Flash Imprint Lithography: Materials and Process Development," Proceedings of the SPIE's International Symposium on Microlithography: Emerging Lithographic Technologies VII, Santa Clara, CA, February 2003.