Nanotribology-based novel characterization techniques for the dielectric charging failure mechanism in electrostatically actuated NEMS/MEMS devices using force-distance curve measurements

Journal of Colloid and Interface Science

Volumn 365, Issue 1, 2012, Pages 236-253

  Zaghloul, Usama ^a,b,c   Bhushan, Bharat ^a   Papaioannou, George ^d   Coccetti, Fabio ^b,c   Pons, Patrick ^b,c   Plana, Robert ^b,c  

^a OHIO STATE UNIVERSITY   (United States)

^b LAAS CNRS   (France)

^c UNIVERSITÉ PAUL SABATIER   (France)

^d UNIVERSITY OF ATHENS   (Greece)

Author keywords

Adhesive force; Dielectric charging; Electrostatic NEMS MEMS; Force distance curve; Nanoscale characterization; Nanotribology; Reliability; RF MEMS switch; Silicon nitride

Indexed keywords

ADHESIVE FORCE; DIELECTRIC CHARGING; FORCE-DISTANCE CURVES; NANOSCALE CHARACTERIZATION; RF-MEMS SWITCHES;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPOSITE MICROMECHANICS; DIELECTRIC DEVICES; DIELECTRIC FILMS; ELECTRIC FIELDS; ELECTRIC SWITCHES; ELECTROSTATIC ACTUATORS; ELECTROSTATIC DEVICES; MEMS; METAL INSULATOR BOUNDARIES; MICROELECTROMECHANICAL DEVICES; MIM DEVICES; NANOSTRUCTURED MATERIALS; NANOTRIBOLOGY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POWER QUALITY; SILICON NITRIDE; SURFACE POTENTIAL; SURFACE PROPERTIES;

CHARACTERIZATION;

GOLD; SILICON NITRIDE; TITANIUM;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; DIELECTRIC CONSTANT; ELECTRIC FIELD; ELECTRICAL EQUIPMENT; FILM; FORCE DISTANCE CURVE MEASUREMENT; KELVIN PROBE FORCE MICROSCOPY; MEASUREMENT; MICROELECTROMECHANICAL SYSTEM; MICROSCOPY; NANOELECTROMECHANICAL SYSTEM; NANOTECHNOLOGY; NANOTRIBOLOGY; PHYSICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLARIZATION; PRIORITY JOURNAL; STATIC ELECTRICITY; SURFACE CHARGE; VAPORIZATION;

MEMBRANES, ARTIFICIAL; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; SILICON COMPOUNDS;

EID: 80054849236     PISSN: 00219797     EISSN: 10957103     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.08.005     Document Type: Article

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