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Journal of Photopolymer Science and Technology

Volumn 24, Issue 1, 2011, Pages 9-18

Recent development in molecular resists for extreme ultraviolet lithography

(2) Nishikubo, Tadatomi a Kudo, Hiroto a

a KANAGAWA UNIVERSITY (Japan)

Author keywords

Chemical amplification; Electron beam; Extreme ultraviolet; Molecular resist; Resist; Resolution; Roughness; Sensitivity

Indexed keywords

EID: 79961117784 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.24.9 Document Type: Article

Times cited : (35)

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