Molecular glass photoresists containing photoacid generator functionality: A route to a single molecule photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Lawson, Richard A ^a   Lee, Cheng Tsung ^a   Whetsell, Robert ^b   Yueh, Wang ^c   Roberts, Jeanette ^c   Tolbert, Laren ^b   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Line edge roughness (LER); Molecular glass; PAG outgassing; Photoacid generator (PAG); Single molecule photoresist

Indexed keywords

LINE EDGE ROUGHNESS (LER); MOLECULAR GLASS; PAG OUTGASSING; PHOTOACID GENERATOR (PAG); SINGLE MOLECULE PHOTORESISTS;

AMORPHOUS FILMS; CHARACTERIZATION; DEGASSING; GLASS; PLASMAS; SILICA; SPIN COATING;

PHOTORESISTS;

EID: 35148843817     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712928     Document Type: Conference Paper

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