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Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 657-664

Extreme ultraviolet (EUV)-resist materials of noria (water wheel-like cyclic oligomer) derivatives containing acetal moieties

(5) Kudo, Hiroto a Jinguji, Mayumi a Nishikubo, Tadatomi a Oizumi, Hiroaki b Itani, Toshiro b

a KANAGAWA UNIVERSITY (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

Acetal; Chemically amplification; Extreme ultraviolet; Noria; Resist

Indexed keywords

EID: 77957110101 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.657 Document Type: Article

Times cited : (31)

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