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Journal of Materials Chemistry

Volumn 20, Issue 21, 2010, Pages 4445-4450

Novel extreme ultraviolet (EUV)-resist material based on noria (water wheel-like cyclic oligomer)

(5) Kudo, Hiroto a Suyama, Yuji a Oizumi, Hiroaki b Itani, Toshiro b Nishikubo, Tadatomi a

a KANAGAWA UNIVERSITY (Japan)

b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC OLIGOMERS; EXTREME ULTRAVIOLETS; FEED RATIOS; FILM-FORMING; HIGHER RESOLUTION; LINE EDGE ROUGHNESS; LINE-AND-SPACE PATTERNS; REACTION TEMPERATURE; RESIST MATERIALS; RESIST SYSTEMS; THERMAL STABILITY; WATER WHEEL;

SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

ULTRAVIOLET DEVICES;

EID: 77952536338 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/b925403j Document Type: Article

Times cited : (48)

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