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Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 373-382

Development of EUV resists in University of Hyogo

(2) Watanabe, Takeo a Kinoshita, Hiroo a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

Chemically amplified resist; EUV; Line edge roughness; Outgassing; Resist; Sensitivity

Indexed keywords

EID: 36148974786 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.20.373 Document Type: Review

Times cited : (12)

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