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Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 649-655

Fundamental decomposition analysis of chemically amplified molecular resist for below 22 nm resolution

(6) Shiono, Daiju a Hada, Hideo a Sato, Kazufumi a Fukushima, Yasuyuki b Watanabe, Takeo b Kinoshita, Hiroo b

a TOKYO OHKA KOGYO CO LTD (Japan)

b University ofHyogo (Japan)

Author keywords

Chemically amplified positive tone; Decomposition analysis; Electron beam lithography; EUV resist; Molecular resist

Indexed keywords

EID: 77957130880 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.649 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.