SCOPUS 정보 검색 플랫폼

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

Molecular resists for EUV and EB lithography

(6) Takemoto, Ichiki a Ando, Nobuo a Edamatsu, Kunishige a Lee, Youngjoon a Takashima, Masayuki a Yokoyama, Hiroyuki a

a SUMITOMO CHEMICAL CO LTD (Japan)

Author keywords

EB; EUV; Gradient shaving; Molecular resists; PAG bonded resist; TOF SIMS

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; POLYMERS; RESINS; ROUGHNESS MEASUREMENT; SECONDARY ION MASS SPECTROMETRY; THICK FILMS; ULTRAVIOLET DEVICES;

EB; EUV; GRADIENT SHAVING; MOLECULAR RESISTS; PAG-BONDED RESIST; TOF-SIMS;

FILM PREPARATION;

EID: 57349137300 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.771880 Document Type: Conference Paper

Times cited : (9)

References (6)

1
- 36148974393
- Evaluation of New Molecular Resist for EUV
- H. Oizumi, Y. Tanaka, T. Kumise, D. Shiono, T. Hirayama, H. Hada, J. Onodera, A. Yamaguchi, " Evaluation of New Molecular Resist for EUV" J Photopolym. Sci. Technol., 20, 403-410 (2007)
- (2007) J Photopolym. Sci. Technol , vol.20 , pp. 403-410
- Oizumi, H.¹ Tanaka, Y.² Kumise, T.³ Shiono, D.⁴ Hirayama, T.⁵ Hada, H.⁶ Onodera, J.⁷ Yamaguchi, A.⁸

2
- 31844440098
- Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resist
- 7B
- T. Hirayama, D. Shiono, S. Matsumaru, T. Ogata, H. Hada, J. Onodera, T. Arai, T. Sakamizu, A. Yamaguchi, H. Shiraishi, H. Fukuda, M. Ueda, " Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resist" Jpn. J Appl. Phys., 44, 7B, 5484-5488 (2005)
- (2005) Jpn. J Appl. Phys , vol.44 , pp. 5484-5488
- Hirayama, T.¹ Shiono, D.² Matsumaru, S.³ Ogata, T.⁴ Hada, H.⁵ Onodera, J.⁶ Arai, T.⁷ Sakamizu, T.⁸ Yamaguchi, A.⁹ Shiraishi, H.¹⁰ Fukuda, H.¹¹ Ueda, M.¹²

3
- 33751157328
- Influence of Polymer Structure on the Miscibility of Photoacid Generators
- K. E. Uhrich, E. Reichmanis, F. A. Baiocchi, "Influence of Polymer Structure on the Miscibility of Photoacid Generators" Chem. Mater. 6, 295-301 (1994)
- (1994) Chem. Mater , vol.6 , pp. 295-301
- Uhrich, K.E.¹ Reichmanis, E.² Baiocchi, F.A.³

4
- 36148974786
- Development of EUV Resist in University of Hyogo
- T. Watanabe, H. Kinoshita, " Development of EUV Resist in University of Hyogo" J. Photopolym. Sci. Technol., 20, 373-382 (2007)
- (2007) J. Photopolym. Sci. Technol , vol.20 , pp. 373-382
- Watanabe, T.¹ Kinoshita, H.²

5
- 35148843817
- Molecular Glass Photoresists Containing Photoacid Generator Functionality: A Route to a Single Molecular Photoresist
- R. A. Lawson, Cheng-Tsung Lee, R. Whetsell, W. Yueh, J. Roberts, L. Tolbert, C. L. Henderson "Molecular Glass Photoresists Containing Photoacid Generator Functionality: A Route to a Single Molecular Photoresist" Proc. SPIE, 6519, 65191N, (2007)
- (2007) Proc. SPIE , vol.6519
- Lawson, R.A.¹ Tsung Lee, C.² Whetsell, R.³ Yueh, W.⁴ Roberts, J.⁵ Tolbert, L.⁶ Henderson, C.L.⁷

6
- 2942558731
- Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations
- N. Man, H. Okumura, H. Oizumi, N. Nagai, H. Seki, I. Nishiyama, "Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations", Applied Surface Science, 231-232, 353-356 (2004)
- (2004) Applied Surface Science , vol.231-232 , pp. 353-356
- Man, N.¹ Okumura, H.² Oizumi, H.³ Nagai, N.⁴ Seki, H.⁵ Nishiyama, I.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.