Recent progress in ArF lithography for the 100nm node

Journal of Photopolymer Science and Technology

Volumn 14, Issue 3, 2001, Pages 333-340

  Goethals, A M ^a   Vandenberghe, G ^a   Pollentier, I ^a   Ercken, M ^a   De Bisschop, P ^a   Maenhoudt, M ^a   Ronse, K ^a  

^a IMEC   (Belgium)

Author keywords

100nm node; 193 nm resists; ArF lithography; Resolution enhancements

Indexed keywords

ADHESION; ARTICLE; MASS SPECTROMETRY; POLYMERIZATION; ROENTGEN SPECTROSCOPY; TECHNIQUE; TECHNOLOGY;

EID: 0035747323     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.333     Document Type: Article

References (27)