Development of new phenylcalix[4]resorcinarene: Its application to positive-tone molecular resist for EB and EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Echigo, Masatoshi ^a   Oguro, Dai ^a  

^a MITSUBISHI GAS CHEMICAL COMPANY INC   (Japan)

Author keywords

Calix 4 resorcinarene; EB; EUV; LER; Lithography; Molecular resist; Positive tone

Indexed keywords

CALIX[4]RESORCINARENE; EB; EUV; LER; MOLECULAR RESIST; POSITIVE-TONE;

ETHERS; ETHYLENE GLYCOL; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTORESISTS; PROPYLENE; ROUGHNESS MEASUREMENT; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; ULTRAVIOLET DEVICES;

ELECTRON BEAM LITHOGRAPHY;

EID: 65849365049     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813487     Document Type: Conference Paper

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