High resolution positive-working molecular resist derived from truxene

Journal of Photopolymer Science and Technology

Volumn 22, Issue 5, 2009, Pages 609-614

  Hattori, Shigeki ^a   Yamada, Arisa ^a   Saito, Satoshi ^a   Asakawa, Koji ^a   Koshiba, Takeshi ^a   Nakasugi, Tetsuro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

50 nm; LWR; Molecular resist; Truxene derivative

Indexed keywords

EID: 77952256559     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.609     Document Type: Article

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