New anionic photoacid generator bound polymer resists for EUV lithography

Macromolecules

Volumn 40, Issue 23, 2007, Pages 8220-8224

  Wang, Mingxing ^a   Yueh, Wang ^b   Gonsalves, Kenneth E ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID GENERATING EFFICIENCY; ADAMANTYL METHACRYLATE (EA); BOUND POLYMERS; HYDROXYSTYRENE;

ELECTRONS; EXTREME ULTRAVIOLET LITHOGRAPHY; PARAFFINS; POLYMERS;

PHOTORESISTS;

EID: 36348978735     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma0715066     Document Type: Article

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